SCHEMBL766940

SCHEMBL766940

C[SiH](C)C=Cc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 2/20 0.50
CHAT P28329 2/20 0.44
TRPA1 O75762 2/20 0.43
RELA Q04206 1/20 0.43
GLA P06280 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
ALDH1A1 P00352 2/20 0.42
LMNA P02545 2/20 0.42
NFE2L2 Q16236 1/20 0.42
CYP19A1 P11511 1/20 0.42
MAOA P21397 1/20 0.42
ALOX5 P09917 1/20 0.42
MAPK1 P28482 1/20 0.42
HDAC3 O15379 1/20 0.41
TNKS O95271 1/20 0.41
HDAC4 P56524 1/20 0.41
HDAC1 Q13547 1/20 0.41
HCAR2 Q8TDS4 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41
HDAC2 Q92769 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3627696 1.00 MAOB (0.50) MAOBCHATTRPA1RELAGLA
Water SCHEMBL27517310 0.97 MAOB (0.48) MAOBCHATTRPA1RELAGLA
Styrene SCHEMBL10776446 0.87 ALDH1A1 (0.56) MAOBCHATTRPA1RELAGLA
SCHEMBL28709885 0.84 MAOB (0.50) MAOBCHATTRPA1RELAGLA
SCHEMBL16896644 0.80 MAOB (0.46) MAOBCHATTRPA1RELAGLA
SCHEMBL919814 0.80 MAOB (0.46) MAOBCHATTRPA1RELAGLA
SCHEMBL304129 0.80 MAOB (0.46) MAOBCHATTRPA1RELAGLA
SCHEMBL17210194 0.80 MAOB (0.46) MAOBCHATTRPA1RELAGLA
SCHEMBL15302396 0.80 MAOB (0.46) MAOBCHATTRPA1RELAGLA
SCHEMBL1011749 0.80 MAOB (0.46) MAOBCHATTRPA1RELAGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 256 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119932584-A Method for synthesizing 1, 1-diaryl compound by using non-activated olefin 哈尔滨工业大学(深圳)(哈尔滨工业大学深圳科技创新研究院) 2025-05-06 CN claimed
CN-119613630-A Graft copolymer composition, ABS resin, and preparation method and application thereof 辽宁金发科技有限公司 2025-03-14 CN claimed
CN-119463499-A Low-stress high-resilience organic silica gel and preparation method thereof 苏州柯仕达电子材料有限公司 2025-02-18 CN claimed
US-20250011621-A1 COMPOSITE COATING, PREPARATION METHOD, AND DEVICE JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) 2025-01-09 US claimed
CN-118909500-A High-temperature-resistant heat-insulating coating, preparation method and application thereof in petrochemical pipeline 青岛中氟氟碳材料有限公司 2024-11-08 CN claimed
EP-4421137-A1 COMPOSITE COATING, PREPARATION METHOD, AND DEVICE Jiangsu Favored Nanotechnology Co., Ltd. (CN) 2024-08-28 EP claimed
CN-118136748-B COB light source with uniform light emission and preparation process thereof 珠海市宏科光电子有限公司 2024-08-16 CN claimed
CN-118222037-A Chopped glass fiber reinforced polypropylene composite material and preparation method thereof 湖州伟悦高分子材料有限公司 2024-06-21 CN claimed
CN-118136748-A COB light source with uniform light emission and preparation process thereof 珠海市宏科光电子有限公司 2024-06-04 CN claimed
CN-115991951-B Composite coating, preparation method and device 江苏菲沃泰纳米科技股份有限公司 2024-02-20 CN claimed
US-20030022953-A1 Antireflective porogens SHIPLEY COMPANY, L.L.C. 2003-01-30 US claimed
US-20020198269-A1 Antireflective porogens SHIPLEY COMPANY, L.L.C. 2002-12-26 US claimed
US-20020065331-A1 Antireflective porogens SHIPLEY COMPANY, L.L.C. 2002-05-30 US claimed
US-6392008-B1 TELECHELIC POLYMERS THE PENN STATE RESEARCH FOUNDATION 2002-05-21 US claimed
EP-1197998-A2 Antireflective porogens Shipley Company LLC (US) 2002-04-17 EP claimed
EP-1172823-A1 Porous materials Shipley Company LLC (US) 2002-01-16 EP claimed
US-6271273-B1 Porous materials SHIPLEY COMPANY, L.L.C. 2001-08-07 US claimed
WO-2001007505-A1 POLYPHOSPHAZENE POLYMERS THE PENN STATE RESEARCH FOUNDATION (US) 2001-02-01 WO claimed
US-5670594-A POLYDIMETHYLSILOXANE POLYMERS WITH VINYL OR ACRYLATE GROUPS FOR INTRAOCULAR LENSES MENICON CO., LTD. (JP) 1997-09-23 US claimed
US-4756989-A Aluminum or silicon substrate, copolymer resist layer comprising vinyl aromatic, ethylenically unsaturated units ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1988-07-12 US claimed