⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formic Acid SCHEMBL28102388 | 0.85 | — | — | |
| Formic Acid SCHEMBL767001 | 0.84 | — | — | |
| Butane SCHEMBL1874913 | 0.81 | — | — | |
| Butane SCHEMBL30927845 | 0.81 | ALDH1A1 (0.44) | — | |
| Formic Acid SCHEMBL27655206 | 0.77 | — | — | |
| Butane SCHEMBL27955181 | 0.77 | — | — | |
| Butane SCHEMBL14855915 | 0.77 | — | — | |
| 1-Propanethiol SCHEMBL25425376 | 0.76 | — | — | |
| Propane SCHEMBL3244056 | 0.76 | — | — | |
| 1-Propanethiol SCHEMBL11035519 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10613440-B2 | Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-04-07 | — | — | US | disclosed |
| US-9217921-B2 | Resist underlayer film forming composition containing silicon having sulfide bond | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-22 | — | — | US | disclosed |
| US-20150210829-A1 | SILICON-CONTAINING EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ONIUM SULFONATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-07-30 | — | — | US | disclosed |
| EP-2881794-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM FOR SILICON-CONTAINING EUV RESIST AND CONTAINING ONIUM SULFONATE | Nissan Chemical Industries, Ltd. (JP) | 2015-06-10 | — | — | EP | disclosed |
| US-20120070994-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-03-22 | — | — | US | disclosed |