⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10133932 | 0.71 | — | — | |
| SCHEMBL19338007 | 0.71 | — | — | |
| SCHEMBL789897 | 0.71 | — | — | |
| SCHEMBL2379600 | 0.70 | — | — | |
| SCHEMBL14420178 | 0.70 | — | — | |
| SCHEMBL2791141 | 0.69 | — | — | |
| SCHEMBL911218 | 0.69 | — | — | |
| SCHEMBL2791140 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL10399361 | 0.67 | — | — | |
| Water SCHEMBL19178498 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 497 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| EP-4398285-A1 | ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| CN-118295212-A | Composition for forming resist underlayer film containing glycol structure | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| US-20240218293-A1 | CLEANING AGENT COMPOSITION AND CLEANING METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-12025916-B2 | Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| WO-2024128199-A1 | RELEASER COMPOSITION FOR PHOTOIRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR PHOTOIRRADIATION RELEASE | 日産化学株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| US-20240201592-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| US-20240184204-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING PROTECTED BASIC ORGANIC GROUP | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-06 | — | — | US | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| CN-101429200-A | Tricyclic benzopyran compound as anti-arrhythmic agents | NISSAN CHEMICAL IND LTD (JP) | 2009-05-13 | — | — | CN | disclosed |
| US-7301032-B2 | 1,2,4-thiadiazole compounds and arthropod controlling composition containing the same | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2007-11-27 | — | — | US | disclosed |
| CN-1324020-C | 1,2, 4-thiadiazole compound and arthropod control composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2007-07-04 | — | — | CN | disclosed |
| CN-1980910-A | Benzopyran compound for treating arrhythmia | NISSAN CHEMICAL IND LTD (JP) | 2007-06-13 | — | — | CN | disclosed |
| CN-1934116-A | Tricyclic benzopyran compounds useful as antiarrhythmic agents | NISSAN CHEMICAL IND LTD (JP) | 2007-03-21 | — | — | CN | disclosed |
| US-20060052422-A1 | 1,2,4-Thiadiazole compounds and arthropod controlling composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-03-09 | — | — | US | disclosed |
| CN-1714086-A | 1,2, 4-thiadiazole compound and arthropod control composition containing the same | SUMITOMO CHEMICAL CO (JP) | 2005-12-28 | — | — | CN | disclosed |
| EP-1569922-A1 | 1,2,4-THIADIAZOLE COMPOUNDS AND ARTHROPOD CONTROLLING COMPOSITION CONTAINING THE SAME | Sumitomo Chemical Company, Limited (JP) | 2005-09-07 | — | — | EP | disclosed |
| WO-2004046125-A1 | 1,2,4-THIADIAZOLE COMPOUNDS AND ARTHROPOD CONTROLLING COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-06-03 | — | — | WO | disclosed |