Propene

Propene

SCHEMBL7670769

C=CC.COCCOC=O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2660 0.89
Ammonia Solution, Strong SCHEMBL28778364 0.87
SCHEMBL7202080 0.87
SCHEMBL29290936 0.87
Propane SCHEMBL28202058 0.84
SCHEMBL24292276 0.82 CA2 (0.38)
SCHEMBL2195577 0.82 CA2 (0.38)
SCHEMBL3669082 0.82 CA2 (0.38)
SCHEMBL15203096 0.82 CA2 (0.38)
SCHEMBL2347183 0.82 CA2 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117603235-A Mixed organic metal oxygen cluster patterning material and preparation method and application thereof 中国科学院福建物质结构研究所 2024-02-27 CN claimed
CN-116773641-A Method for directly sampling and measuring alcohol ether and trace elements in ester high-purity solvent or hydrogen peroxide 江苏怡达化学股份有限公司 2023-09-19 CN claimed
CN-115968873-A Stable-component insecticide containing deltamethrin and preparation method thereof 佛山市正典生物技术有限公司 2023-04-18 CN claimed
CN-119241583-A Organic-inorganic hybrid { Zr6Sn4Crystalline tin-zirconium-oxygen cluster patterning material and preparation method and application thereof 中国科学院福建物质结构研究所 2025-01-03 CN disclosed
CN-119241604-A Organic-inorganic hybrid { Ti3In}xCrystalline state titanium indium oxide cluster patterning material and preparation method and application thereof 中国科学院福建物质结构研究所 2025-01-03 CN disclosed
CN-118393812-B Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-08-30 CN disclosed
CN-118244581-B Composition and preparation method thereof, patterned film, patterned substrate, semiconductor device and preparation method thereof 珠海基石科技有限公司 2024-08-13 CN disclosed
CN-118393812-A Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-07-26 CN disclosed
CN-118244581-A Composition and preparation method thereof, patterned film, patterned substrate, semiconductor device and preparation method thereof 珠海基石科技有限公司 2024-06-25 CN disclosed
CN-117603235-A Mixed organic metal oxygen cluster patterning material and preparation method and application thereof 中国科学院福建物质结构研究所 2024-02-27 CN disclosed
CN-116773641-A Method for directly sampling and measuring alcohol ether and trace elements in ester high-purity solvent or hydrogen peroxide 江苏怡达化学股份有限公司 2023-09-19 CN disclosed
CN-115968873-A Stable-component insecticide containing deltamethrin and preparation method thereof 佛山市正典生物技术有限公司 2023-04-18 CN disclosed
CN-115220300-A Patterning material, patterning composition, and pattern forming method 华为技术有限公司 2022-10-21 CN disclosed
WO-2022218315-A1 PATTERNING MATERIAL, PATTERNING COMPOSITION, AND PATTERN FORMING METHOD 华为技术有限公司 2022-10-20 WO disclosed
CN-108102460-B Infrared curing printing ink and preparation method and application thereof 广州昊毅新材料科技股份有限公司 2021-07-30 CN disclosed
CN-106752314-B UV (ultraviolet) curing printing ink 上海新世纪齿科材料有限公司 2020-08-14 CN disclosed
US-6491729-B1 Dry-cleaning solvent composition Lee, Chin Yen (TW) 2002-12-10 US disclosed
US-6491729-B1 Dry-cleaning solvent composition Lee, Chin Yen (TW) 2002-12-10 US disclosed