SCHEMBL767129

SCHEMBL767129

CCC(C(C)=O)C(=O)O.CCC(C(C)=O)C(=O)O.[Zr]

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.38
CHRM1 P11229 1/20 0.38
AKR1A1 P14550 1/20 0.38
CHRM3 P20309 1/20 0.38
HTR2A P28223 1/20 0.38
HTR2C P28335 1/20 0.38
ADRA1A P35348 1/20 0.38
HRH1 P35367 1/20 0.38
DRD3 P35462 1/20 0.38
SLC6A3 Q01959 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC2 Q92769 1/20 0.38
CA2 P00918 1/20 0.37
MAPK1 P28482 1/20 0.37
SLC1A3 P43003 1/20 0.36
SLC1A2 P43004 1/20 0.36
SLC1A1 P43005 1/20 0.36
FFAR3 O14843 2/20 0.35
ALDH1A1 P00352 2/20 0.35
TP53 P04637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL766948 1.00 TDP1 (0.38) TDP1CHRM1AKR1A1CHRM3HTR2A
SCHEMBL767045 1.00 TDP1 (0.38) TDP1CHRM1AKR1A1CHRM3HTR2A
SCHEMBL5683149 0.97 TDP1 (0.36) TDP1CHRM1AKR1A1CHRM3HTR2A
SCHEMBL157028 0.97
SCHEMBL487333 0.94 TDP1 (0.38) TDP1CHRM1AKR1A1CHRM3HTR2A
SCHEMBL21519882 0.94 TDP1 (0.38) TDP1CHRM1AKR1A1CHRM3HTR2A
SCHEMBL21219177 0.94 TDP1 (0.38) TDP1CHRM1AKR1A1CHRM3HTR2A
SCHEMBL21225948 0.94 TDP1 (0.38) TDP1CHRM1AKR1A1CHRM3HTR2A
SCHEMBL9153552 0.94 TDP1 (0.38) TDP1CHRM1AKR1A1CHRM3HTR2A
SCHEMBL11554076 0.94 TDP1 (0.38) TDP1CHRM1AKR1A1CHRM3HTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118027874-A Plasticine-like shaping adhesive 圣戈班汇杰(杭州)新材料有限公司 2024-05-14 CN claimed
US-5905109-A HYDROLYSIS AND CONDENSATION TO FORM POLYMERS WITH CATALYSTS JSR CORPORATION (JP) 1999-05-18 US claimed
CN-120202272-A Pressure-sensitive adhesive sheet with release sheet 日东电工株式会社 2025-06-24 CN disclosed
CN-115996830-B Flexible tube for endoscope, endoscopic medical device, and method for producing same 富士胶片株式会社 2025-05-13 CN disclosed
CN-119768742-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2025-04-04 CN disclosed
CN-119563142-A Composition for forming silicon-containing resist underlayer film containing multifunctional sulfonic acid 日产化学株式会社 2025-03-04 CN disclosed
CN-119487453-A Method for manufacturing laminate and method for manufacturing semiconductor element 日产化学株式会社 2025-02-18 CN disclosed
CN-119300769-A Acoustic wave probe, acoustic wave measuring device, and ultrasonic diagnostic device 富士胶片株式会社 2025-01-10 CN disclosed
US-20240419073-A1 ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2024-12-19 US disclosed
CN-112947000-B Composition for forming silicon-containing EUV resist underlayer film containing sulfonate 日产化学工业株式会社 2024-11-29 CN disclosed
US-20240393693-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION, LAMINATE USING THE COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT NISSAN CHEMICAL CORPORATION (JP) 2024-11-28 US disclosed
EP-1331518-A2 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR Corporation (JP) 2003-07-30 EP disclosed
US-20030139486-A1 Radiation sensitive refractive index changing composition and refractive index changing method JSR CORPORATION (JP) 2003-07-24 US disclosed
EP-1323742-A2 Radiation sensitive refractive index changing composition and refractive index changing method JSR Corporation (JP) 2003-07-02 EP disclosed
US-20030064303-A1 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern JSR CORPORATION (JP) 2003-04-03 US disclosed
EP-1235104-A1 COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN JSR Corporation (JP) 2002-08-28 EP disclosed
US-20010009936-A1 Method of manufacturing material for forming insulating film JSR CORPORATION (JP) 2001-07-26 US disclosed
EP-1117102-A2 Method of manufacturing material for forming insulating film JSR Corporation (JP) 2001-07-18 EP disclosed
EP-1106661-A2 Coating composition and hardened film obtained therefrom JSR Corporation (JP) 2001-06-13 EP disclosed
EP-1045290-A2 Composition for resist underlayer film and method for producing the same JSR Corporation (JP) 2000-10-18 EP disclosed