SCHEMBL7673058

SCHEMBL7673058

C=CC(Cl)OC(=O)C(=C)C

nearest known ligand 0.41

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
TSHR P16473 3/20 0.38
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11663987 0.80
SCHEMBL6646058 0.79
SCHEMBL27385530 0.77 ALDH1A1 (0.44) ALDH1A1TSHRTHRB
SCHEMBL10912037 0.77
SCHEMBL3174519 0.77
SCHEMBL27583804 0.76
SCHEMBL809329 0.76 TSHR (0.43) ALDH1A1TSHRTHRB
SCHEMBL37915 0.76 ALDH1A1 (0.42) ALDH1A1TSHRTHRB
SCHEMBL8816362 0.76 ALDH1A1 (0.42) ALDH1A1TSHRTHRB
SCHEMBL16767715 0.75 ALDH1A1 (0.38) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0087169-B1 POSITIVE RESIST MATERIAL Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. (DE) 1986-06-11 EP claimed
US-6458907-B1 ORGANOMETALLIC POLYMERIZABLE MONOMER ACID OR ESTER ARE USEFUL AS RESISTS AND ARE SENSITIVE TO IMAGING IRRADIATION WHILE EXHIBITING ENHANCED RESISTANCE TO REACTIVE ION ETCHING. INTERNATIONAL BUSINESS MACHINES CORPORATION 2002-10-01 US disclosed
US-6171757-B1 USEFUL AS RESISTS AND WHICH ARE SENSITIVE TO IMAGING IRRADIATION WHILE EXHIBITING ENHANCED RESISTANCE TO REACTIVE ION ETCHING INTERNATIONAL BUSINESS MACHINES CORPORATION 2001-01-09 US disclosed
US-5677366-A Seeded microemulsion polymerization for the production of small polymer particles W. L. GORE & ASSOCIATES, INC. (US) 1997-10-14 US disclosed
EP-0764173-A1 SEEDED MICROEMULSIOIN POLYMERIZATION FOR THE PRODUCTION OF SMALL POLYMER PARTICLES W.L. GORE & ASSOCIATES, INC. (US) 1997-03-26 EP disclosed
US-5523346-A Seeded microemulsion polymerization for the production of small polymer particles W. L. GORE & ASSOCIATES, INC. (US) 1996-06-04 US disclosed
WO-1995034583-A1 SEEDED MICROEMULSIOIN POLYMERIZATION FOR THE PRODUCTION OF SMALL POLYMER PARTICLES W.L. GORE & ASSOCIATES, INC. (US) 1995-12-21 WO disclosed
US-5460872-A Process for coating microporous substrates and products therefrom W. L. GORE & ASSOCIATES, INC. (US) 1995-10-24 US disclosed
WO-1995026988-A1 METHOD FOR THE PREPARATION OF A MACROPOROUS POLYMERIC SORBENT ALLTECH FRANCE, S.A.R.L. (FR) 1995-10-12 WO disclosed
US-4201702-A Process to produce allyl halides copolymers BLOUNT DAVID H 1980-05-06 US disclosed