⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL200206 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL30594918 | 0.93 | — | — | |
| Bromide SCHEMBL22407698 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL127053 | 0.93 | — | — | |
| SCHEMBL10748747 | 0.93 | — | — | |
| Iodide SCHEMBL29042352 | 0.93 | — | — | |
| Hydrochloric Acid SCHEMBL6637499 | 0.93 | — | — | |
| SCHEMBL811660 | 0.93 | — | — | |
| SCHEMBL2351930 | 0.93 | — | — | |
| SCHEMBL7912373 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9446994-B1 | Polymer composite comprising metal based nanoparticles in a polymer matrix | CORNERSTONE RESEARCH GROUP, INC. (US) | 2016-09-20 | — | — | US | disclosed |
| US-9233883-B1 | Polymer composite comprising metal based nanoparticles in a polymer matrix | CORNERSTONE RESEARCH GROUP, INC. (US) | 2016-01-12 | — | — | US | disclosed |
| EP-1391476-B1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2015-12-09 | — | — | EP | disclosed |
| US-8883550-B2 | Deposition processes for photovoltaic devices | PRECURSOR ENERGETICS, INC. (US) | 2014-11-11 | — | — | US | disclosed |
| US-8828782-B2 | Annealing processes for photovoltaics | PRECURSOR ENERGETICS, INC. (US) | 2014-09-09 | — | — | US | disclosed |
| US-8741182-B2 | Methods and materials for AIGS silver-containing photovoltaics | PRECURSOR ENERGETICS, INC. (US) | 2014-06-03 | — | — | US | disclosed |
| US-8721930-B2 | Polymeric precursors for AIGS silver-containing photovoltaics | PRECURSOR ENERGETICS, INC. (US) | 2014-05-13 | — | — | US | disclosed |
| US-8715775-B2 | Precursors and uses for CIS and CIGS photovoltaics | PRECURSOR ENERGETICS, INC. (US) | 2014-05-06 | — | — | US | disclosed |
| US-8715537-B2 | Molecular precursor methods and materials for optoelectronics | PRECURSOR ENERGETICS, INC. (US) | 2014-05-06 | — | — | US | disclosed |
| US-8628696-B2 | Molecular precursors for optoelectronics | PRECURSOR ENERGETICS, INC. (US) | 2014-01-14 | — | — | US | disclosed |
| US-20110030755-A1 | METHODS FOR PHOTOVOLTAIC ABSORBERS WITH CONTROLLED GROUP 11 STOICHIOMETRY | PRECURSOR ENERGETICS, INC. (US) | 2011-02-10 | — | — | US | disclosed |
| US-20110030796-A1 | METHODS AND ARTICLES FOR CAIGS SILVER-CONTAINING PHOTOVOLTAICS | PRECURSOR ENERGETICS, INC. (US) | 2011-02-10 | — | — | US | disclosed |
| US-20110030800-A1 | METHODS FOR CAIGS SILVER-CONTAINING PHOTOVOLTAICS | PRECURSOR ENERGETICS, INC. (US) | 2011-02-10 | — | — | US | disclosed |
| WO-2011017237-A2 | POLYMERIC PRECURSORS FOR CAIGS AND AIGS SILVER-CONTAINING PHOTOVOLTAICS | PRECURSOR ENERGETICS, INC. (US) | 2011-02-10 | — | — | WO | disclosed |
| WO-2011017235-A2 | METHODS FOR PHOTOVOLTAIC ABSORBERS WITH CONTROLLED STOICHIOMETRY | PRECURSOR ENERGETICS, INC. (US) | 2011-02-10 | — | — | WO | disclosed |
| US-7312013-B2 | Photoreactive composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-7238615-B2 | Formation method for metal element, production method for semiconductor device, production method for electronic device, semiconductor device, electronic device, and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2007-07-03 | — | — | US | disclosed |
| US-20040202956-A1 | a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-10-14 | — | — | US | disclosed |
| US-20040203235-A1 | Formation method for metal element, production method for semiconductor device, production method for electronic device, semiconductor device, electronic device, and electronic equipment | SEIKO EPSON CORPORATION (JP) | 2004-10-14 | — | — | US | disclosed |
| EP-1391476-A1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-02-25 | — | — | EP | disclosed |