⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27850208 | 0.84 | — | — | |
| Anthraquinone SCHEMBL27530712 | 0.83 | MEN1 (0.41) | — | |
| SCHEMBL5451479 | 0.81 | — | — | |
| SCHEMBL2994011 | 0.75 | — | — | |
| SCHEMBL2605833 | 0.75 | — | — | |
| SCHEMBL10012495 | 0.75 | — | — | |
| SCHEMBL7756628 | 0.75 | — | — | |
| SCHEMBL1704846 | 0.75 | — | — | |
| SCHEMBL29914241 | 0.75 | — | — | |
| SCHEMBL1706473 | 0.75 | CYP1A2 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2015161195-A1 | COMPOSITIONS AND METHODS COMPRISING NTRIFICATION INHIBITORS CONTAINING A MIXTURE OF PROTIC AND APROTIC SOLVENT SYSTEMS | MCKNIGHT GARY DAVID (US) | 2015-10-22 | — | — | WO | claimed |
| EP-2168008-B1 | SPACER LITHOGRAPHY | ADVANCED MICRO DEVICES INC (US) | 2014-11-26 | — | — | EP | claimed |
| CN-1646572-A | Curing of coatings induced by plasma | CIBA SC HOLDING AG (CH) | 2005-07-27 | — | — | CN | claimed |
| US-5858620-A | Semiconductor device and method for manufacturing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1999-01-12 | — | — | US | claimed |
| CN-115960073-B | N-halogenated acetyl diphenylamine derivative and preparation method and medical application thereof | 中国药科大学 | 2024-09-27 | — | — | CN | disclosed |
| CN-115960073-A | N-halogenated acetyl diphenylamine derivative and preparation method and medical application thereof | 中国药科大学 | 2023-04-14 | — | — | CN | disclosed |
| CN-109790264-B | Phenolic hydroxyl group-containing resin and resist material | DIC株式会社 | 2021-09-21 | — | — | CN | disclosed |
| CN-105531260-A | Oxime ester photoinitiators | BASF SE | 2016-04-27 | — | — | CN | disclosed |
| CN-101563412-B | Adhesion promotion additives and methods for improving coating compositions | DOW GLOBAL TECHNOLOGIES INC | 2014-07-16 | — | — | CN | disclosed |
| CN-102216400-B | Radiation curable coating materials | BASF SE | 2013-12-18 | — | — | CN | disclosed |
| CN-101910335-B | Composition for antiglare hardcoat, and method for production thereof | NIDEK KK | 2013-05-22 | — | — | CN | disclosed |
| CN-101218311-B | Protective coating for window glass | DOW GLOBAL TECHNOLOGIES INC | 2012-11-21 | — | — | CN | disclosed |
| EP-0724575-B1 | METHOD OF PREPARING UNSYMMETRICALLY SUBSTITUED TRIAZINES | BASF AG (DE) | 1997-09-17 | — | — | EP | disclosed |
| EP-0724575-A1 | METHOD OF PREPARING UNSYMMETRICALLY SUBSTITUED TRIAZINES | BASF AG (DE) | 1996-08-07 | — | — | EP | disclosed |
| WO-1995011237-A1 | METHOD OF PREPARING UNSYMMETRICALLY SUBSTITUED TRIAZINES | BASF AKTIENGESELLSCHAFT (DE) | 1995-04-27 | — | — | WO | disclosed |
| EP-0363171-B1 | Method of and apparatus for forming volume type phase hologram | FUJITSU LTD (JP) | 1994-02-23 | — | — | EP | disclosed |
| US-5231440-A | Method of and apparatus for forming volume type phase hologram | FUJITSU LIMITED (JP) | 1993-07-27 | — | — | US | disclosed |
| US-5154994-A | Exposing holographic material of polymeric matrix with radiation active substance to interference pattern to form latent image, developing by dipping into swelling solution of solvent mixture, pulling, vaporizing solvents | FUJITSU LIMITED (JP) | 1992-10-13 | — | — | US | disclosed |
| EP-0363171-A2 | Method of and apparatus for forming volume type phase hologram | FUJITSU LIMITED (JP) | 1990-04-11 | — | — | EP | disclosed |
| EP-0135863-A2 | Carbonylmethyleneheterocycles containing trihalogenmethyl-groups, process for their preparation and light-sensitive mixtures containing them | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-04-03 | — | — | EP | disclosed |