SCHEMBL7694535

SCHEMBL7694535

[N-]=[N+]=C(S(=O)(=O)c1ccccc1)S(=O)(=O)C1CCCCC1

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.40
KDM4E B2RXH2 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
POLB P06746 1/20 0.37
RAB9A P51151 1/20 0.37
MAPT P10636 1/20 0.36
TSHR P16473 1/20 0.35
ESR1 P03372 1/20 0.35
EPHX2 P34913 1/20 0.35
ACHE P22303 1/20 0.34
ENPP3 O14638 2/20 0.34
ENPP1 P22413 2/20 0.34
ENPP2 Q13822 2/20 0.34
GAA P10253 1/20 0.34
NPC1 O15118 1/20 0.34
ALOX15 P16050 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3174047 0.85 KMT2A (0.37) ALDH1A1KDM4EMEN1KMT2ARAB9A
SCHEMBL563060 0.85 ALDH1A1 (0.44) ALDH1A1KDM4EMEN1KMT2APOLB
SCHEMBL3167031 0.85 ALDH1A1 (0.41) ALDH1A1MEN1KMT2AACHEGAA
SCHEMBL4918318 0.85 ALDH1A1 (0.36) ALDH1A1KDM4EMEN1KMT2APOLB
SCHEMBL3174918 0.83 MEN1 (0.40) ALDH1A1MEN1KMT2ARAB9AMAPT
SCHEMBL3177199 0.83 ALDH1A1 (0.37) ALDH1A1MEN1KMT2APOLBRAB9A
SCHEMBL30137798 0.83 MEN1 (0.40) ALDH1A1MEN1KMT2ARAB9AMAPT
SCHEMBL30137810 0.83 ALDH1A1 (0.37) ALDH1A1MEN1KMT2APOLBRAB9A
SCHEMBL3176289 0.83 KMT2A (0.36) ALDH1A1KDM4EMEN1KMT2AMAPT
SCHEMBL3170255 0.83 ALDH1A1 (0.39) ALDH1A1MEN1KMT2AACHEGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115185156-A Photosensitive resin composition for forming partition wall, organic electroluminescent element, image display device, and illumination 三菱化学株式会社 2022-10-14 CN disclosed
CN-109661855-B Photosensitive resin composition for forming organic electroluminescent element spacer, organic electroluminescent element, image display device, and lighting 三菱化学株式会社 2022-07-08 CN disclosed
US-20080233518-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE WITH SUCH CHEMICALLY AMPLIFIED RESIST COMPOSITION NEC ELECTRONICS CORPORATION (JP) 2008-09-25 US disclosed
US-6338931-B1 PHOTOACID GENERATOR OF SULFONYLDIAZOMETHANE COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-01-15 US disclosed
US-6090518-A HAVING HIGH RESOLUTION, WHICH IS USEFUL FOR A HALFMICRONLITHOGRAPHY EMPLOYING A RADIATION MITSUBISHI CHEMICAL CORPORATION (JP) 2000-07-18 US disclosed