SCHEMBL7697295

SCHEMBL7697295

CCO[Si](CC)(OCC)O[Si](CC)(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5701534 0.94
SCHEMBL1484145 0.85
SCHEMBL5701375 0.82
SCHEMBL5248386 0.82
SCHEMBL39837 0.78
SCHEMBL1482699 0.78
SCHEMBL5701412 0.77
SCHEMBL1482800 0.76
SCHEMBL6865192 0.76
Ammonia Solution, Strong SCHEMBL6653979 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106243357-B It can the siliceous anti-reflection agent peelled off of wet type 罗门哈斯电子材料有限责任公司 2019-07-23 CN disclosed
US-10031420-B2 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-07-24 US disclosed
CN-106243357-A Can the siliceous anti-reflection agent peelled off of wet type 罗门哈斯电子材料有限责任公司 2016-12-21 CN disclosed
US-20160363861-A1 WET-STRIPPABLE SILICON-CONTAINING ANTIREFLECTANT ROHM AND HAAS ELECTRONIC MATERIALS LLC 2016-12-15 US disclosed
US-9442377-B1 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-09-13 US disclosed
US-6344579-B1 REACTION OF FLUOROSILICON COMPOUND WITH REACTION OF SILICON WITH HYDROXY, ALKOXY OR ARYLOXY GROUP WITH DIFLUORODIAMINO COMPOUND MITSUI CHEMICALS, INC. (JP) 2002-02-05 US disclosed
EP-1138633-A1 PROCESS FOR PRODUCING FLUORINATED SILICON COMPOUND Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed