⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7700698 | 0.80 | — | — | |
| SCHEMBL7700606 | 0.75 | — | — | |
| SCHEMBL8054299 | 0.55 | — | — | |
| SCHEMBL10731634 | 0.54 | MAPT (0.33) | — | |
| SCHEMBL10735259 | 0.53 | PSEN1 (0.35) | — | |
| SCHEMBL11084589 | 0.52 | GAA (0.33) | — | |
| SCHEMBL27608706 | 0.51 | TSHR (0.40) | — | |
| SCHEMBL1206900 | 0.51 | GRM2 (0.30) | — | |
| SCHEMBL3737244 | 0.51 | CYP2D6 (0.31) | — | |
| SCHEMBL1297231 | 0.50 | HRH3 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6465147-B1 | MIXING A PHOTORESIST POLYMER HAVING ONE OR MORE HYDROXYL GROUPS AND A CROSS-LINKER COMPOUND HAVING TWO OR MORE ALDEHYDE GROUPS IN THE PRESENCE OF A PHOTOACID GENERATOR TO PRODUCE A NEGATIVE PHOTORESIST COMPOSITION | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-15 | — | — | US | disclosed |