Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM2 | Q14416 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL565428 | 0.83 | — | — | |
| SCHEMBL6684600 | 0.83 | — | — | |
| SCHEMBL4933851 | 0.82 | — | — | |
| SCHEMBL14859876 | 0.81 | HSD11B1 (0.30) | — | |
| SCHEMBL167533 | 0.81 | — | — | |
| SCHEMBL14860278 | 0.79 | — | — | |
| SCHEMBL14142587 | 0.77 | — | — | |
| SCHEMBL1518812 | 0.73 | APLNR (0.34) | — | |
| SCHEMBL4933857 | 0.72 | — | — | |
| SCHEMBL6910162 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070255027-A1 | ALKENE-ACRYLATE-NORBORNENE TERPOLYMER AND METHOD FOR PREPARING THE SAME | LG CHEM, LTD. (KR) | 2007-11-01 | — | — | US | claimed |
| US-6720129-B2 | PHOTORESIST COMPRISING FLUOROALKYLATED UNITS OF PHTHALIMIDE AND NORBORNENE-BASED ESTERS SUCH AS 2-METHOXYBUTYL-2-ADAMANTANYL 5-NORBORNENE-2-CARBOXYLATE; ETCH RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS | HYNIX SEMICONDUCTOR INC (KR) | 2004-04-13 | — | — | US | claimed |
| US-20020164541-A1 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR, INC. (KR) | 2002-11-07 | — | — | US | claimed |
| US-20020091216-A1 | Novel photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-07-11 | — | — | US | claimed |
| US-6410670-B1 | PHOTOLITHOGRAPHY | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-06-25 | — | — | US | claimed |
| US-6368770-B1 | CARBOXY NORBORNENE COMPOUND | HYUNDAI ELECTRONICS INDUSTRIES CO. LTD. (KR) | 2002-04-09 | — | — | US | claimed |
| JP-10218947-A | — | — | None | — | — | JP | disclosed |
| JP-11171935-A | — | — | None | — | — | JP | disclosed |
| US-20230303740-A1 | OPTICAL GRADE MOULDING COMPOSITIONS HAVING INCREASED THERMAL STABILITY | RÖHM GMBH (DE) | 2023-09-28 | — | — | US | disclosed |
| EP-4041785-B1 | OPTICAL GRADE MOULDING COMPOSITIONS HAVING INCREASED THERMAL STABILITY | ROEHM GMBH (DE) | 2023-01-25 | — | — | EP | disclosed |
| EP-3417033-B1 | FORMULATION OF AN ORGANIC FUNCTIONAL MATERIAL | MERCK PATENT GMBH (DE) | 2021-02-24 | — | — | EP | disclosed |
| US-8999625-B2 | Silicon-containing antireflective coatings including non-polymeric silsesquioxanes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-04-07 | — | — | US | disclosed |
| WO-2014171984-A2 | SILICON-CONTAINING ANTIREFLECTIVE COATINGS INCLUDING NON-POLYMERIC SILSESQUIOXANES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-10-23 | — | — | WO | disclosed |
| US-6235447-B1 | FORMING PATTERN; SEMICONDUCTOR | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-05-22 | — | — | US | disclosed |
| JP-2001081142-A | COPOLYMER FOR PHOTORESIST AND ITS PRODUCTION, PHOTORESIST COMPOSITION, METHOD FOR FORMING PHOTORESIST PATTERN AND SEMICONDUCTOR ELEMENT | HYUNDAI ELECTRONICS IND CO LTD | 2001-03-27 | — | — | JP | disclosed |
| US-6200731-B1 | A DI(5-NORBORNENE-2-CARBOXYLIC ACID-3-CARBOXYLATE) COMPOUND FOR PREPARING A PHOTORESIST COPOLYMER AND IMPROVING THE POLYMERIZATION YIELD, REDUCE THE PRODUCTION COST | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-03-13 | — | — | US | disclosed |
| US-6165672-A | Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-12-26 | — | — | US | disclosed |
| US-6150069-A | Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-11-21 | — | — | US | disclosed |
| JP-H11171935-A | COPOLYMER RESIN, ITS PRODUCTION, PHOTORESIST CONTAINING THE COPOLYMER RESIN, ITS PRODUCTION AND SEMICONDUCTOR ELEMENT | HYUNDAI ELECTRON IND CO LTD | 1999-06-29 | — | — | JP | disclosed |
| JP-H10218947-A | PHOTOSENSITIVE FILM COPOLYMER, ITS PRODUCTION, PHOTOSENSITIVE FILM, ITS PRODUCTION, METHOD FOR SYNTHESIZING MONOMER, PRODUCTION OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | HYUNDAI ELECTRON IND CO LTD | 1998-08-18 | — | — | JP | disclosed |