SCHEMBL7701591

SCHEMBL7701591

CC(OC(=O)C(=O)O)c1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.58
ALDH1A1 P00352 2/20 0.44
TP53 P04637 1/20 0.44
HSD17B10 Q99714 1/20 0.44
KMT2A Q03164 1/20 0.44
KLK7 P49862 1/20 0.44
FFAR1 O14842 1/20 0.42
CYP3A4 P08684 1/20 0.42
ESR1 P03372 1/20 0.42
ESR2 Q92731 1/20 0.42
CYP2D6 P10635 1/20 0.41
SRC P12931 1/20 0.41
LPAR1 Q92633 2/20 0.41
LPAR3 Q9UBY5 1/20 0.41
ALOX5 P09917 2/20 0.41
GABRA1 P14867 1/20 0.40
GABRG2 P18507 1/20 0.40
GABRB3 P28472 1/20 0.40
GABRA5 P31644 1/20 0.40
GABRA3 P34903 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8088686 0.91 HCAR2 (0.61) HCAR2ALDH1A1TP53HSD17B10KMT2A
SCHEMBL6536955 0.88 HCAR2 (0.47) HCAR2ALDH1A1TP53HSD17B10LPAR1
SCHEMBL16085915 0.86 HCAR2 (0.56) HCAR2ALDH1A1TP53HSD17B10KMT2A
SCHEMBL28468520 0.84 ESR1 (0.45) HCAR2ALDH1A1KMT2ACYP3A4ESR1
SCHEMBL3786371 0.83 HCAR2 (0.61) HCAR2ALDH1A1TP53HSD17B10KMT2A
SCHEMBL3786370 0.83 HCAR2 (0.61) HCAR2ALDH1A1TP53HSD17B10KMT2A
SCHEMBL871943 0.83 HCAR2 (0.61) HCAR2ALDH1A1TP53HSD17B10KMT2A
SCHEMBL3625234 0.83 HCAR2 (0.61) HCAR2ALDH1A1TP53HSD17B10KMT2A
SCHEMBL1694877 0.83 HCAR2 (0.61) HCAR2ALDH1A1TP53HSD17B10KMT2A
SCHEMBL3625229 0.83 HCAR2 (0.61) HCAR2ALDH1A1TP53HSD17B10KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6348432-B1 COPOLYMER CONTAINING METHYL METHACRYLATE AND (METH)ACRYLIC ACID MONOMERS; (THIO)FLUORAN, SPIROPYRAN, TRIARYLMETHANE, XANTHENE, OR METHINE COLOR FORMER; AND DEVELOPER; COATING; HEAT ACTIVATING; FREE OF PROTECTIVE COATING NASHUA CORPORATION 2002-02-19 US claimed
WO-2000053428-A1 HEAT-SENSITIVE COATING CONTAINING ACRYLATE COPOLYMER, RECORDING MATERIAL AND METHODS OF MANUFACTURE NASHUA CORPORATION (US) 2000-09-14 WO claimed
JP-5085054-A None JP disclosed
JP-7002736-A None JP disclosed
JP-7237355-A None JP disclosed
CN-111527156-B Ink composition for offset printing, method for producing printed matter, and method for improving gloss of printed matter 阪田油墨株式会社 2022-11-25 CN disclosed
CN-111527156-A Active energy ray-curable ink composition for offset printing, method for producing printed matter using same, and method for improving gloss of printed matter 阪田油墨株式会社 2020-08-11 CN disclosed
CN-100588557-C 4-hydroxy-4' -isopropoxydiphenyl sulfone developer dispersion, method of wet grinding, and thermal recording media OJI PAPER CO 2010-02-10 CN disclosed
CN-100577439-C Thermal recording medium OJI PAPER CO 2010-01-06 CN disclosed
CN-100379580-C 1, 2-bis (3-methylphenoxy) ethane composition and thermal recording medium prepared by using the same SANKO CO LTD (JP) 2008-04-09 CN disclosed
CN-101090831-A Heat-sensitive recording material OJI PAPER CO (JP) 2007-12-19 CN disclosed
CN-1933979-A 4-hydroxy-4' -isopropoxydiphenyl sulfone developer dispersion, method of wet grinding, and thermal recording media OJI PAPER CO (JP) 2007-03-21 CN disclosed
CN-1750939-A 1, 2-bis (3-methylphenoxy) ethane composition and thermal recording medium prepared by using the same SANKO CO LTD (JP) 2006-03-22 CN disclosed
US-6348432-B1 COPOLYMER CONTAINING METHYL METHACRYLATE AND (METH)ACRYLIC ACID MONOMERS; (THIO)FLUORAN, SPIROPYRAN, TRIARYLMETHANE, XANTHENE, OR METHINE COLOR FORMER; AND DEVELOPER; COATING; HEAT ACTIVATING; FREE OF PROTECTIVE COATING NASHUA CORPORATION 2002-02-19 US disclosed
WO-2000053428-A1 HEAT-SENSITIVE COATING CONTAINING ACRYLATE COPOLYMER, RECORDING MATERIAL AND METHODS OF MANUFACTURE NASHUA CORPORATION (US) 2000-09-14 WO disclosed
JP-H07237355-A THERMAL RECORDING MATERIAL NEW OJI PAPER CO LTD 1995-09-12 JP disclosed
JP-H072736-A PRODUCTION OF DIBASIC ACID ESTER DAINIPPON INK & CHEM INC 1995-01-06 JP disclosed
JP-H0585054-A THERMAL RECORDING MATERIAL DAINIPPON INK & CHEM INC 1993-04-06 JP disclosed