⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8676774 | 0.97 | CA1 (0.52) | — | |
| SCHEMBL31510311 | 0.97 | CA1 (0.52) | — | |
| SCHEMBL31510310 | 0.97 | CA1 (0.52) | — | |
| SCHEMBL165310 | 0.92 | — | — | |
| SCHEMBL626215 | 0.79 | — | — | |
| SCHEMBL493857 | 0.78 | CA1 (0.53) | — | |
| SCHEMBL3093303 | 0.76 | CA1 (0.50) | — | |
| SCHEMBL493682 | 0.76 | CA1 (0.50) | — | |
| SCHEMBL17672300 | 0.76 | CA1 (0.50) | — | |
| SCHEMBL9788227 | 0.76 | CA1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11742519-B2 | Silicon-based energy storage devices with electrolyte additive compounds | ENEVATE CORPORATION (US) | 2023-08-29 | — | — | US | claimed |
| EP-4651192-A2 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | Lam Research Corporation (US) | 2025-11-19 | — | — | EP | disclosed |
| US-12474638-B2 | Underlayer for photoresist adhesion and dose reduction | LAM RESEARCH CORPORATION (US) | 2025-11-18 | — | — | US | disclosed |
| US-20250328076-A1 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | LAM RES CORP (US) | 2025-10-23 | — | — | US | disclosed |
| EP-4591122-A1 | BAKE-SENSITIVE UNDERLAYERS TO REDUCE DOSE TO SIZE OF EUV PHOTORESIST | Lam Research Corporation (US) | 2025-07-30 | — | — | EP | disclosed |
| US-20250205680-A1 | FUNCTIONALIZED AND CROSSLINKED MATERIALS | X DEV LLC (US) | 2025-06-26 | — | — | US | disclosed |
| US-20250205683-A1 | LIFETIME IMPROVEMENT OF FUNCTIONALIZED MATERIALS | X DEV LLC (US) | 2025-06-26 | — | — | US | disclosed |
| US-20250205681-A1 | POLYMER REINFORCEMENT ON DOUBLE AMINE COATED SORBENT | X DEV LLC (US) | 2025-06-26 | — | — | US | disclosed |
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | disclosed |
| US-20250053092-A1 | AQUEOUS ACID DEVELOPMENT OR TREATMENT OF ORGANOMETALLIC PHOTORESIST | LAM RES CORP (US) | 2025-02-13 | — | — | US | disclosed |
| EP-4038454-A2 | SUBSTRATE SURFACE MODIFICATION WITH HIGH EUV ABSORBERS FOR HIGH PERFORMANCE EUV PHOTORESISTS | Lam Research Corporation (US) | 2022-08-10 | — | — | EP | disclosed |
| CN-114730133-A | Substrate surface modification with high EUV absorber for high performance EUV photoresists | 朗姆研究公司 | 2022-07-08 | — | — | CN | disclosed |
| WO-2022119563-A1 | COMPOSITION AND METHOD FOR TREATMENT OF ISCHEMIC DISEASE | SHIH CHUN CHE | 2022-06-09 | — | — | WO | disclosed |
| US-11314168-B2 | Underlayer for photoresist adhesion and dose reduction | LAM RESEARCH CORPORATION (US) | 2022-04-26 | — | — | US | disclosed |
| CN-114200776-A | Underlayer for photoresist adhesion and dose reduction | 朗姆研究公司 | 2022-03-18 | — | — | CN | disclosed |
| US-11254786-B2 | Multifunctional degradable nanoparticles with control over size and functionalities | VANDERBILT UNIVERSITY (US) | 2022-02-22 | — | — | US | disclosed |
| US-20220043334-A1 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | LAM RESEARCH CORPORATION (US) | 2022-02-10 | — | — | US | disclosed |
| US-20220035247-A1 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | LAM RESEARCH CORPORATION (US) | 2022-02-03 | — | — | US | disclosed |
| US-6348564-B1 | UNSUBSTITUTED OXEPANE-DIONES PREPARED BY OXIDATION OF CYCLOHEXANEDIONES; BIOCOMPATIBILITY, BIODEGRADATION, NONTOXIC | SOLVAY (SOCIETE ANONYME) (BE) | 2002-02-19 | — | — | US | disclosed |
| EP-1061078-A1 | Cyclic esterketone compounds, processes for the synthesis thereof and process for the preparation of poly(esterketone)polymers | SOLVAY (Société Anonyme) (BE) | 2000-12-20 | — | — | EP | disclosed |