SCHEMBL770383

SCHEMBL770383

NS(=O)(=O)C(F)(F)C(F)(F)F

nearest known ligand 0.67

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA2 P00918 12/20 0.67
CA1 P00915 10/20 0.67
CA7 P43166 2/20 0.67
CA13 Q8N1Q1 1/20 0.67
CA9 Q16790 7/20 0.35
CA5A P35218 5/20 0.35
F2 P00734 3/20 0.33
PRSS1 P07477 3/20 0.33
PRSS2 P07478 3/20 0.33
PRSS3 P35030 3/20 0.33
CA4 P22748 1/20 0.33
CA6 P23280 1/20 0.33
CA5B Q9Y2D0 1/20 0.33
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP9 P14780 1/20 0.31
MMP8 P22894 1/20 0.31
MMP13 P45452 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11889612 0.97 CA2 (0.62) CA2CA1CA7CA13CA9
Lithium SCHEMBL31254542 0.97 CA2 (0.62) CA2CA1CA7CA13CA9
SCHEMBL1518074 0.97 CA2 (0.62) CA2CA1CA7CA13CA9
SCHEMBL14973544 0.97 CA2 (0.62) CA2CA1CA7CA13CA9
Potassium SCHEMBL38650879 0.97 CA2 (0.62) CA2CA1CA7CA13CA9
SCHEMBL5888855 0.97 CA2 (0.62) CA2CA1CA7CA13CA9
Ammonia Solution, Strong SCHEMBL14973579 0.97 CA2 (0.62) CA2CA1CA7CA13CA9
SCHEMBL16340930 0.85 CA1 (0.64) CA2CA1CA7CA13CA9
SCHEMBL22070114 0.81 CA1 (0.60) CA2CA1CA7CA13CA9
Trifluoromethanesulfonamide SCHEMBL6602452 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 623 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024139622-A1 COMPOSITE MATERIAL AND PREPARATION METHOD THEREFOR, AND LIGHT-EMITTING DEVICE TCL科技集团股份有限公司 2024-07-04 WO claimed
CN-118265424-A Composite material, preparation method thereof, light-emitting device and display device TCL科技集团股份有限公司 2024-06-28 CN claimed
CN-118198489-A Electrolyte additive, preparation method thereof, non-aqueous electrolyte containing electrolyte additive and secondary battery 苏州祺添新材料股份有限公司 2024-06-14 CN claimed
CN-118156609-A Electrolyte additive, preparation method thereof, non-aqueous electrolyte containing electrolyte additive and secondary battery 苏州祺添新材料股份有限公司 2024-06-07 CN claimed
CN-118156610-A Electrolyte additive, preparation method thereof, non-aqueous electrolyte containing electrolyte additive and secondary battery 苏州祺添新材料股份有限公司 2024-06-07 CN claimed
CN-118085155-A Perfluorinated ionomer with high oxygen permeability and weak adsorption, preparation method and application thereof 武汉大学 2024-05-28 CN claimed
CN-117916923-A Secondary battery, battery module, battery pack, and electricity device 宁德时代新能源科技股份有限公司 2024-04-19 CN claimed
CN-117766767-A Artificial SEI film, preparation method thereof and lithium battery 蜂巢能源科技股份有限公司 2024-03-26 CN claimed
CN-117625109-A Adhesive composition comprising polyurethane and cationic dopant 伊英克公司 2024-03-01 CN claimed
CN-117501498-A Composite materials comprising fluorinated amides and their use in electrochemical cells 魁北克电力公司 2024-02-02 CN claimed
CN-101356668-A Electrode, method for manufacturing the same, and battery SONY CORP (JP) 2009-01-28 CN claimed
EP-1910256-A2 METHOD FOR THE C-ALKYLATION OF HYDROXYL AROMATIC COMPOUNDS RHODIA CHIMIE (FR) 2008-04-16 EP claimed
WO-2007015015-A2 METHOD FOR THE C-ALKYLATION OF HYDROXYL AROMATIC COMPOUNDS RHODIA CHIMIE (FR) 2007-02-08 WO claimed
WO-2006091020-A1 LITHIUM SECONDARY BATTERY WITH HIGH PERFORMANCE LG CHEM, LTD. (KR) 2006-08-31 WO claimed
EP-1516229-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2005-03-23 EP claimed
JP-2004531492-A 2004-10-14 JP claimed
EP-1414568-A2 METAL BISTRIFLIMIDE COMPOUNDS, THEIR SYNTHESIS AND THEIR USES The Queen's University of Belfast (GB) 2004-05-06 EP claimed
WO-2003107093-A2 PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS CLARIANT INTERNATIONAL LTD (CH) 2003-12-24 WO claimed
WO-2002072260-A2 METAL BIS-TRIFLIMIDE COMPOUNDS, THEIR SYNTHESIS AND THEIR USES THE QUEEN'S UNIVERSITY OF BELFAST (GB) 2002-09-19 WO claimed
CN-1333580-A Non-aqueous electrochemistry device MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2002-01-30 CN claimed