SCHEMBL770567

SCHEMBL770567

B.[Cr].[Fe]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29138647 0.87
Methane SCHEMBL27955585 0.87
SCHEMBL28266651 0.87
SCHEMBL17798849 0.87
SCHEMBL10600479 0.87
SCHEMBL14767905 0.87
SCHEMBL507909 0.87
SCHEMBL29051903 0.87
SCHEMBL62000 0.82
SCHEMBL50967 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116213630-A Forging processing equipment and forging method for iron-chromium-boron cast wear-resistant alloy 内蒙古中天宏远稀土新材料股份公司 2023-06-06 CN claimed
CN-116117649-A Forging and polishing equipment for iron-chromium-boron cast wear-resistant alloy and application method thereof 内蒙古中天宏远稀土新材料股份公司 2023-05-16 CN claimed
US-12017326-B2 Powder contact member and method for surface treatment of powder contact member FUJI MANUFACTURING CO., LTD. (JP) 2024-06-25 US disclosed
US-20230150088-A1 POWDER CONTACT MEMBER AND METHOD FOR SURFACE TREATMENT OF POWDER CONTACT MEMBER FUJI MANUFACTURING CO., LTD. (JP) 2023-05-18 US disclosed
US-20200282516-A1 POWDER CONTACT MEMBER AND METHOD FOR SURFACE TREATMENT OF POWDER CONTACT MEMBER FUJI MANUFACTURING CO., LTD. (JP) 2020-09-10 US disclosed
CN-211017453-U DT L outlet type wear-resistant composite material wiring terminal with reinforced chromium, boron and iron 重庆昆凌电子科技有限公司 2020-07-14 CN disclosed
CN-211017453-U DT L outlet type wear-resistant composite material wiring terminal with reinforced chromium, boron and iron 重庆昆凌电子科技有限公司 2020-07-14 CN disclosed
CN-106040997-A Precise casting technology for wear-resisting metal component 宁波吉威熔模铸造有限公司 2016-10-26 CN disclosed
US-9186775-B2 Method for producing elastic grinding material, elastic grinding material, and blasting method using said elastic grinding material FUJI MANUFACTURING CO., LTD. (JP) 2015-11-17 US disclosed
CN-104417632-A Cargo floor assembly JIANGSU KAWEI AUTOMOTIVE INDUSTRY GROUP CO LTD 2015-03-18 CN disclosed
US-20140329441-A1 METHOD FOR PRODUCING ELASTIC GRINDING MATERIAL, ELASTIC GRINDING MATERIAL, AND BLASTING METHOD USING SAID ELASTIC GRINDING MATERIAL FUJI MANUFACTURING CO., LTD (JP) 2014-11-06 US disclosed
US-8389301-B2 Non-uniform switching based non-volatile magnetic based memory AVALANCHE TECHNOLOGY, INC. (US) 2013-03-05 US disclosed
US-20120068236-A1 NON-UNIFORM SWITCHING BASED NON-VOLATILE MAGNETIC BASED MEMORY AVALANCHE TECHNOLOGY, INC. (US) 2012-03-22 US disclosed
US-20120069643-A1 NON-UNIFORM SWITCHING BASED NON-VOLATILE MAGNETIC BASED MEMORY AVALANCHE TECHNOLOGY, INC. (US) 2012-03-22 US disclosed
US-20120069649-A1 NON-UNIFORM SWITCHING BASED NON-VOLATILE MAGNETIC BASED MEMORY AVALANCHE TECHNOLOGY, INC. (US) 2012-03-22 US disclosed
US-8084835-B2 Non-uniform switching based non-volatile magnetic based memory AVALANCHE TECHNOLOGY, INC. (US) 2011-12-27 US disclosed
WO-2009108212-A1 AN IMPROVED LOW RESISTANCE HIGH-TMR MAGNETIC TUNNEL JUNCTION AND PROCESS FOR FABRICATION THEREOF YADAV TECHNOLOGY, INC. (US) 2009-09-03 WO disclosed
US-20080164548-A1 LOW RESISTANCE HIGH-TMR MAGNETIC TUNNEL JUNCTION AND PROCESS FOR FABRICATION THEREOF YADAV TECHNOLOGY (US) 2008-07-10 US disclosed
US-20080094886-A1 NON-UNIFORM SWITCHING BASED NON-VOLATILE MAGNETIC BASED MEMORY STRUCTURED ALPHA LP (CA) 2008-04-24 US disclosed
US-20050263221-A1 Alloy composition and process for the manufacture of glass making moulds LAKELAND KENNETH D 2005-12-01 US disclosed