Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.76 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.76 |
| ▸ | USP2 | O75604 | 1/20 | 0.76 |
| ▸ | GAA | P10253 | 1/20 | 0.76 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.76 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.76 |
| ▸ | FASN | P49327 | 1/20 | 0.59 |
| ▸ | CLK1 | P49759 | 3/20 | 0.58 |
| ▸ | DYRK1A | Q13627 | 3/20 | 0.58 |
| ▸ | DYRK1B | Q9Y463 | 3/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | HPGD | P15428 | 2/20 | 0.56 |
| ▸ | NPC1 | O15118 | 1/20 | 0.56 |
| ▸ | TP53 | P04637 | 1/20 | 0.56 |
| ▸ | MAPT | P10636 | 1/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.56 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.55 |
| ▸ | CES2 | O00748 | 1/20 | 0.55 |
| ▸ | CA12 | O43570 | 2/20 | 0.53 |
| ▸ | CA1 | P00915 | 2/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10350386 | 0.94 | MEN1 (0.79) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL19196874 | 0.87 | MEN1 (0.74) | MEN1KMT2AUSP2GAAKEAP1 | |
| 2,4-Dihydroxybenzophenone SCHEMBL29351647 | 0.86 | MEN1 (1.00) | MEN1KMT2AUSP2GAAKEAP1 | |
| 2,4-Dihydroxybenzophenone SCHEMBL28108552 | 0.86 | MEN1 (1.00) | MEN1KMT2AUSP2GAAKEAP1 | |
| 2,4-Dihydroxybenzophenone SCHEMBL39681 | 0.86 | MEN1 (1.00) | MEN1KMT2AUSP2GAAKEAP1 | |
| 2,4-Dihydroxybenzophenone SCHEMBL1699129 | 0.86 | MEN1 (1.00) | MEN1KMT2AUSP2GAAKEAP1 | |
| 2,4-Dihydroxybenzophenone SCHEMBL30201813 | 0.86 | MEN1 (1.00) | MEN1KMT2AUSP2GAAKEAP1 | |
| 2,4-Dihydroxybenzophenone SCHEMBL28179616 | 0.86 | MEN1 (1.00) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL5709932 | 0.86 | KMT2A (0.67) | MEN1KMT2AUSP2GAAKEAP1 | |
| SCHEMBL30374826 | 0.86 | KMT2A (0.67) | MEN1KMT2AUSP2GAAKEAP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6383708-B1 | ALKALI SOLUBLE NOVOLAK RESIN AN ESTER OF HYDROXYL GROUPS CONTAINING QUINONE DIAZIDE SULFONIC ACID AND SOLVENTS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-07 | — | — | US | disclosed |
| EP-0557991-B1 | Positive type resist composition | SUMITOMO CHEMICAL CO (JP) | 2000-01-26 | — | — | EP | disclosed |
| EP-0550009-B1 | Positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1999-06-02 | — | — | EP | disclosed |
| EP-0461654-B1 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1999-02-17 | — | — | EP | disclosed |
| US-5849457-A | Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and γ- | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-12-15 | — | — | US | disclosed |
| EP-0559204-B1 | Positive type resist composition | SUMITOMO CHEMICAL CO (JP) | 1998-09-30 | — | — | EP | disclosed |
| EP-0510671-B1 | Positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1997-11-12 | — | — | EP | disclosed |
| US-5686557-A | Polyamide resin which can be dissolved in alcohol solvent, composition thereof, and method of use thereof | TOMOEGAWA PAPER CO., LTD. (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0525185-B1 | POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL CO (JP) | 1997-07-16 | — | — | EP | disclosed |
| EP-0571989-B1 | Positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1997-03-12 | — | — | EP | disclosed |
| EP-0550009-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-07-07 | — | — | EP | disclosed |
| EP-0528401-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-24 | — | — | EP | disclosed |
| US-5188920-A | Photosensitivity, resolution, heat resistance, adhesiveness | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-02-23 | — | — | US | disclosed |
| EP-0525185-A1 | POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1993-02-03 | — | — | EP | disclosed |
| EP-0510670-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| EP-0510671-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-10-28 | — | — | EP | disclosed |
| US-5130225-A | And alkali soluble resin, a quinone oxazide compound and a hydroxyl containing compound, film thickness retention | SUMITOMO CHEMICAL CO. LTD. (JP) | 1992-07-14 | — | — | US | disclosed |
| EP-0461388-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0461654-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-18 | — | — | EP | disclosed |
| EP-0460416-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-12-11 | — | — | EP | disclosed |