SCHEMBL7717529

SCHEMBL7717529

FC(F)F.O=C1NC(=O)C2=C1C1CCC2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8501155 0.91 DAO (0.30)
SCHEMBL9248536 0.91 DAO (0.30)
SCHEMBL612988 0.91 DAO (0.30)
Trifluoromethanesulfonic Acid SCHEMBL3921811 0.77 PTGS2 (0.31)
SCHEMBL6944629 0.69 DAO (0.39)
SCHEMBL2484399 0.64 DAO (0.32)
SCHEMBL9231007 0.62
SCHEMBL12583840 0.62
SCHEMBL6099140 0.61
SCHEMBL10759055 0.60 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6379861-B1 POLY(METH)ACRYLATE ESTER WITH TERTIARY OR QUATERNARY CARBON AND PHOTOACTIVE COMPOUND; HIGH RESOLUTION RELIEF IMAGES; CHEMICALLY-AMPLIFIED POSITIVES SHIPLEY COMPANY, L.L.C. 2002-04-30 US disclosed
US-6136501-A PHOTORESIST COMPOSITION COMPRISING PHOTOACTIVE COMPONENT AND POLYMER THAT COMPRISES ESTER GROUPS SHIPLEY COMPANY, L.L.C. (US) 2000-10-24 US disclosed