SCHEMBL7718181

SCHEMBL7718181

C=C(C)C(C)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6506795 0.73
SCHEMBL3257049 0.73
SCHEMBL2612412 0.71
SCHEMBL2029627 0.71
SCHEMBL11124002 0.71
SCHEMBL1271227 0.69
SCHEMBL17490527 0.69
SCHEMBL8405476 0.67
SCHEMBL15668095 0.67 ALDH1A1 (0.36)
SCHEMBL2684672 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118834230-A Tetramethyl divinyl disilazane and preparation method thereof 浙江硕而博化工有限公司 2024-10-25 CN disclosed
CN-114634524-B Preparation method and application of dimethylvinylchlorosilane 江西贝特利新材料有限公司 2023-12-26 CN disclosed
CN-115368843-A Anion household film and preparation method thereof 东莞市赛越新材料科技有限公司 2022-11-22 CN disclosed
CN-114634524-A Preparation method and application of dimethylvinylchlorosilane 江西贝特利新材料有限公司 2022-06-17 CN disclosed
CN-105837614-A Preparation method of methylphenylvinylethoxysilane 佛山市华联有机硅有限公司 2016-08-10 CN disclosed
US-20020024011-A1 Method for correcting opaque defects in reticles for charged-particle-beam microlithography, and reticles produced using same NIKON CORPORATION 2002-02-28 US disclosed
EP-0903217-B1 Cast-molding material for plastic lens and process for the production of plastic lens HOYA CORP (JP) 2001-10-24 EP disclosed
EP-0739652-B1 Method for the continuous production of room-temperature-curable organopolysiloxane compositions DOW CORNING TORAY SILICONE (JP) 2001-05-30 EP disclosed
US-6187888-B1 CONTAINING, AS ESSENTIAL COMPONENTS, A COMBINATION OF DIETHYLENE GLYCOL BISALLYLCARBONATE OR A MIXTURE OF DIETHYLENE GLYCOL BISALLYLCARBONATE AND A MONOMER COPOLYMERIZABLE THEREWITH, AND A POLYETHER-MODIFIED SILICONE COMPOUND HOYA CORPORATION 2001-02-13 US disclosed
US-6056900-A COMBINATION OF (A) DIETHYLENE GLYCOL BISALLYLCARBONATE OR A MIXTURE WITH A MONOMER COPOLYMERIZABLE THEREWITH, WITH (B) A POLYETHER-MODIFIED SILICONE COMPOUND; ALMOST FREE FROM CAUSING DEFECTIVE DYEING WHEN DYED HOYA CORPORATION (JP) 2000-05-02 US disclosed
EP-0903217-A2 Cast-molding material for plastic lens and process for the production of plastic lens Hoya Corporation (JP) 1999-03-24 EP disclosed
US-5861460-A MIXING POLYSILOXANE WITH AN ORGANOSILANE HAVING TWO SILICON-BONDED HYDROLYZABLE GROUPS, POWDERED INORGANIC FILLER AND CURE-ACCELERATING CATALYST, THEN VACUUM DEGASSING YIELDS STRONG, DURABLE CURED POLYSILOXANES; EFFICIENCY DOW CORNING TORAY SILICONE CO., LTD. (JP) 1999-01-19 US disclosed
WO-1998017709-A1 METHOD FOR PREPARING A HYBRID SOL TO BE USED FOR THE INACTIVATION OF ASBESTOS TRUYOL ALBERT (FR) 1998-04-30 WO disclosed
EP-0739652-A1 Method for the continuous production of room-temperature-curable organopolysiloxane compositions Dow Corning Toray Silicone Company Limited (JP) 1996-10-30 EP disclosed