SCHEMBL7718520

SCHEMBL7718520

CC(C)(C)OC(=O)C1C2C=CC(O2)C1C(=O)OC(C)(C)C

nearest known ligand 0.37

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 3/20 0.37
MAPK1 P28482 1/20 0.35
KMT2A Q03164 3/20 0.33
MEN1 O00255 1/20 0.33
ALDH1A1 P00352 4/20 0.33
KDM4E B2RXH2 2/20 0.32
NFKB1 P19838 1/20 0.32
NFKB2 Q00653 1/20 0.32
RELA Q04206 1/20 0.32
TP53 P04637 1/20 0.30
GAA P10253 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
DGAT1 O75907 1/20 0.30
USP2 O75604 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7715585 0.93 PPM1B (0.37) PPM1BMAPK1KMT2AMEN1ALDH1A1
SCHEMBL7716854 0.89 MAPK1 (0.35) PPM1BMAPK1KMT2AMEN1ALDH1A1
SCHEMBL7714345 0.86 PPM1B (0.32) PPM1BMAPK1ALDH1A1
SCHEMBL7718513 0.83 PPM1B (0.30) PPM1B
SCHEMBL7710855 0.83 PPM1B (0.30) PPM1B
SCHEMBL7715611 0.82 MIF (0.30)
SCHEMBL7715707 0.81
SCHEMBL9696402 0.76 PPM1B (0.44) PPM1BKMT2AMEN1ALDH1A1KDM4E
SCHEMBL2005428 0.76 PPM1B (0.44) PPM1BKMT2AMEN1ALDH1A1KDM4E
SCHEMBL2002666 0.76 PPM1B (0.44) PPM1BKMT2AMEN1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6372854-B1 POLYALKENAMERS USED AS PHOTORESISTS HAVING EXCELLENT OPTICAL ELECTRICAL PROPERTIES; HIGH RIGIDITY; HEAT RESISTANCE; ADHESION AND WEAR RESISTANCE; HYDROGENATION; ACIDOLYSIS MITSUI CHEMICALS, INC. (JP) 2002-04-16 US disclosed
US-6291131-B1 ADDITION POLYMERIZATION OF MONOMERS TO FORM PHOTORESISTS COPOLYMER HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2001-09-18 US disclosed