Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | NPC1 | O15118 | 1/20 | 0.56 |
| ▸ | CYP11B1 | P15538 | 2/20 | 0.53 |
| ▸ | CYP11B2 | P19099 | 2/20 | 0.53 |
| ▸ | TNF | P01375 | 1/20 | 0.53 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 3/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 3/20 | 0.50 |
| ▸ | ALPL | P05186 | 2/20 | 0.50 |
| ▸ | ALPG | P10696 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.50 |
| ▸ | ALPI | P09923 | 1/20 | 0.50 |
| ▸ | PLAA | Q9Y263 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7160203 | 0.84 | TDP1 (0.61) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| SCHEMBL11460254 | 0.83 | KDM4E (0.65) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| SCHEMBL2882482 | 0.83 | TDP1 (0.59) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| SCHEMBL8017568 | 0.80 | TDP1 (0.56) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| SCHEMBL11498670 | 0.79 | KDM4E (0.56) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| SCHEMBL1035783 | 0.77 | EGLN3 (0.71) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| Hydrogen Sulfide SCHEMBL28767930 | 0.76 | EGLN3 (0.69) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| Hydrochloric Acid SCHEMBL1082612 | 0.76 | EGLN3 (0.69) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| SCHEMBL1038315 | 0.76 | KDM4E (0.69) | TDP1KDM4ENPC1CYP11B1CYP11B2 | |
| SCHEMBL10881570 | 0.76 | KDM4E (0.65) | TDP1KDM4ENPC1EGLN3LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111116512-A | Preparation method of organic zinc salt containing nitrogen and sulfur benzo heterocycle | 鹤壁中昊新材料科技有限公司 | 2020-05-08 | — | — | CN | claimed |
| US-6395393-B1 | MULTILAYER; CORE WITH PHOTOCURABLE COVERINGS | THE FURUKAWA ELECTRIC CO., LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| US-6174604-B1 | BINDER COMPRISING A RADICAL POLYMERIZABLE OLIGOMER, A RADICAL POLYMERIZABLE MONOMER, A PHOTOPOLYMERIZATION INITIATOR, AND A SILICONE COMPOUND MODIFIED WITH A GROUP CONTAINING A LONG CHAIN ETHYLENE OXIDE-PROPYLENE OXIDE; SUBMARINE CABLES | THE FURUKAWA ELECTRIC CO., LTD. (JP) | 2001-01-16 | — | — | US | disclosed |
| EP-0791671-B1 | Surface treating agent for copper or copper alloy | SHIKOKU CHEM (JP) | 1999-06-16 | — | — | EP | disclosed |
| US-5795409-A | MIXTURE OF A (BENZ)IMIDAZOLE COMPOUND, CHELATE COMPOUND AND IRON | SHIKOKU CHEMICALS CORPORATION (JP) | 1998-08-18 | — | — | US | disclosed |
| EP-0791671-A1 | Surface treating agent for copper or copper alloy | SHIKOKU CHEMICALS CORPORATION (JP) | 1997-08-27 | — | — | EP | disclosed |
| EP-0627499-B1 | Agent for treating surfaces of copper and copper alloys | SHIKOKU CHEM (JP) | 1997-07-23 | — | — | EP | disclosed |
| US-5560785-A | TREATING SURFACE WITH SOLUTION OF IMIDAZOLE COMPOUND, COPPER COMPOUND, ZINC COMPOUND, STABILIZERS | SHIKOKU CHEMICALS CORPORATION (JP) | 1996-10-01 | — | — | US | disclosed |
| US-5498301-A | ON A PRINTED WIRING BOARD, HEAT RESISTANT, MOISTURE RESISTANT, A 2-ARYLIMIDAZOLE, CARBOXYLIC ACID, AMMONIA, WATER | SHIKOKU CHEMICALS CORPORATION (JP) | 1996-03-12 | — | — | US | disclosed |
| EP-0627499-A1 | Agent for treating surfaces of copper and copper alloys | SHIKOKU CHEMICALS CORPORATION (JP) | 1994-12-07 | — | — | EP | disclosed |