Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 2/20 | 0.31 |
| ▸ | OPRD1 | P41143 | 2/20 | 0.31 |
| ▸ | OPRK1 | P41145 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3871104 | 0.90 | ALDH1A1 (0.37) | OPRM1OPRD1OPRK1ALDH1A1 | |
| SCHEMBL9700680 | 0.85 | ALDH1A1 (0.33) | OPRM1OPRD1OPRK1ALDH1A1 | |
| SCHEMBL10833373 | 0.85 | ALDH1A1 (0.33) | OPRM1OPRD1OPRK1ALDH1A1 | |
| SCHEMBL325355 | 0.85 | ALDH1A1 (0.37) | OPRM1OPRD1OPRK1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL11320260 | 0.82 | ALDH1A1 (0.35) | OPRM1OPRD1OPRK1ALDH1A1 | |
| SCHEMBL192060 | 0.82 | KDM4E (0.33) | OPRM1OPRD1OPRK1 | |
| SCHEMBL11257285 | 0.81 | LCK (0.35) | OPRM1OPRD1OPRK1ALDH1A1 | |
| SCHEMBL16893342 | 0.80 | ALDH1A1 (0.33) | OPRK1ALDH1A1 | |
| SCHEMBL554718 | 0.79 | LCK (0.39) | — | |
| Hydrochloric Acid SCHEMBL4154585 | 0.78 | LCK (0.32) | OPRM1OPRD1OPRK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6479207-B1 | COMPONENT LAYER CONTAINS A PARTICLE COMPRISING AN ORGANIC PARTICLE CORE COVERED WITH A MATERIAL CONTAINING A LIGHT-HEAT CONVERSION MATERIAL | KONICA CORPORATION (JP) | 2002-11-12 | — | — | US | disclosed |
| EP-0466025-B1 | Resist material, method for the production of the same and process of forming resist patterns using the same | NIPPON TELEGRAPH & TELEPHONE (JP) | 1999-03-10 | — | — | EP | disclosed |
| US-5457003-A | Polysiloxane, polysilsesquioxane | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1995-10-10 | — | — | US | disclosed |
| EP-0466025-A2 | Resist material, method for the production of the same and process of forming resist patterns using the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1992-01-15 | — | — | EP | disclosed |