⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12336470 | 0.75 | — | — | |
| Dianhydrogalactitol SCHEMBL8375579 | 0.72 | THRB (0.30) | — | |
| Dianhydrogalactitol SCHEMBL17264073 | 0.72 | THRB (0.30) | — | |
| Dianhydrogalactitol SCHEMBL4304284 | 0.72 | THRB (0.30) | — | |
| Dianhydrogalactitol SCHEMBL4306431 | 0.72 | THRB (0.30) | — | |
| SCHEMBL622244 | 0.72 | — | — | |
| SCHEMBL6007125 | 0.72 | — | — | |
| Dianhydrogalactitol SCHEMBL16387832 | 0.72 | THRB (0.30) | — | |
| Dianhydrogalactitol SCHEMBL21761430 | 0.72 | THRB (0.30) | — | |
| Dianhydrogalactitol SCHEMBL4307933 | 0.72 | THRB (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6425996-B1 | ADJUSTING ELECTROCONDUCTIVITY | ATOTECH DEUTSCHLAND GMBH (DE) | 2002-07-30 | — | — | US | claimed |
| EP-1042538-B1 | AQUEOUS BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF COPPER COATINGS | ATOTECH DEUTSCHLAND GMBH (DE) | 2001-07-11 | — | — | EP | claimed |
| EP-1042538-A2 | WATER BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF COPPER COATINGS | ATOTECH Deutschland GmbH (DE) | 2000-10-11 | — | — | EP | claimed |
| WO-1999031300-A2 | WATER BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF COPPER COATINGS | ATOTECH DEUTSCHLAND GMBH (DE) | 1999-06-24 | — | — | WO | claimed |
| EP-0178580-A2 | Intermediates for the synthesis of carboxylic acids | ZAMBON S.p.A. (IT) | 1986-04-23 | — | — | EP | claimed |
| US-10982046-B2 | Reaction products and use of same in defoamer compositions and methods for defoaming | BASF SE | 2021-04-20 | — | — | US | disclosed |
| EP-3166990-B1 | REACTION PRODUCTS AND USE OF SAME IN DEFOAMER COMPOSITIONS AND METHODS FOR DEFOAMING | BASF SE (DE) | 2018-10-24 | — | — | EP | disclosed |
| US-20170158813-A1 | REACTION PRODUCTS AND USE OF SAME IN DEFOAMER COMPOSITIONS AND METHODS FOR DEFOAMING | BASF SE (DE) | 2017-06-08 | — | — | US | disclosed |
| EP-3166990-A1 | REACTION PRODUCTS AND USE OF SAME IN DEFOAMER COMPOSITIONS AND METHODS FOR DEFOAMING | BASF SE (DE) | 2017-05-17 | — | — | EP | disclosed |
| CN-105849148-A | Curable compositions that include hydrazide functional materials | PPG工业俄亥俄公司 | 2016-08-10 | — | — | CN | disclosed |
| CN-103492950-B | Photocurable and thermosetting resin composition | TAIYO INK MFG. Co.,Ltd. (JP) | 2016-04-13 | — | — | CN | disclosed |
| WO-2016005477-A1 | REACTION PRODUCTS AND USE OF SAME IN DEFOAMER COMPOSITIONS AND METHODS FOR DEFOAMING | BASF SE (DE) | 2016-01-14 | — | — | WO | disclosed |
| CN-104516201-A | Photo-curable resin composition, photo-curable dry film, cured product and printed circuit board | TAIYO INK SUZHOU CO LTD | 2015-04-15 | — | — | CN | disclosed |
| CN-104281005-A | Curable resin composition, cured product thereof, printed circuit board comprising the same, and method for producing the cured product | TAIYO INK MFG CO LTD | 2015-01-14 | — | — | CN | disclosed |
| CN-101970096-B | Microcapsules with radiation-induced or thermal release | BASF SE (DE) | 2014-10-01 | — | — | CN | disclosed |
| CN-1617710-A | Liposome composition for delivery of nucleic acid | ALZA CORP (US) | 2005-05-18 | — | — | CN | disclosed |
| US-6425996-B1 | ADJUSTING ELECTROCONDUCTIVITY | ATOTECH DEUTSCHLAND GMBH (DE) | 2002-07-30 | — | — | US | disclosed |
| EP-1042538-B1 | AQUEOUS BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF COPPER COATINGS | ATOTECH DEUTSCHLAND GMBH (DE) | 2001-07-11 | — | — | EP | disclosed |
| EP-1042538-A2 | WATER BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF COPPER COATINGS | ATOTECH Deutschland GmbH (DE) | 2000-10-11 | — | — | EP | disclosed |
| WO-1999031300-A2 | WATER BATH AND METHOD FOR ELECTROLYTIC DEPOSITION OF COPPER COATINGS | ATOTECH DEUTSCHLAND GMBH (DE) | 1999-06-24 | — | — | WO | disclosed |