SCHEMBL7744447

SCHEMBL7744447

Cc1cc(C(c2ccc(O)c(C)c2)C(C)(C)C)ccc1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 10/20 0.52
TDP1 Q9NUW8 4/20 0.46
TP53 P04637 1/20 0.46
ESR2 Q92731 7/20 0.44
AR P10275 3/20 0.44
PDE10A Q9Y233 1/20 0.43
NR3C1 P04150 1/20 0.41
PGR P06401 1/20 0.41
TRPA1 O75762 1/20 0.41
PTGS1 P23219 1/20 0.41
CACNA1C Q13936 1/20 0.41
KDM4E B2RXH2 3/20 0.38
MAPT P10636 3/20 0.38
ALOX15 P16050 2/20 0.38
HIF1A Q16665 2/20 0.38
HSD17B10 Q99714 2/20 0.38
ALDH1A1 P00352 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2D6 P10635 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11050693 0.83 ESR1 (0.50) ESR1TDP1TP53ESR2AR
SCHEMBL14220562 0.82 ESR1 (0.50) ESR1TDP1TP53ESR2AR
SCHEMBL9202318 0.80 ESR1 (0.48) ESR1TDP1TP53ESR2AR
SCHEMBL14217130 0.80 ESR1 (0.48) ESR1TDP1TP53ESR2AR
SCHEMBL30142684 0.78 TP53 (0.54) ESR1TDP1TP53ESR2AR
SCHEMBL217919 0.78 TP53 (0.54) ESR1TDP1TP53ESR2AR
SCHEMBL29465801 0.78 TP53 (0.54) ESR1TDP1TP53ESR2AR
SCHEMBL30343462 0.78 TP53 (0.54) ESR1TDP1TP53ESR2AR
SCHEMBL674987 0.78 TP53 (0.54) ESR1TDP1TP53ESR2AR
SCHEMBL13359801 0.77 TDP1 (0.48) ESR1TDP1TP53ESR2AR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1053509-A4 PHOTOSENSITIVE DIAZONAPHTHOQUINONE ESTERS BASED ON SELECTED CYCLIC ALKYL ETHER-CONTAINING PHENOLICS AND THEIR USE IN RADIATION SENSITIVE MIXTURES ARCH SPEC CHEM INC (US) 2001-10-17 EP disclosed
EP-1053509-A1 PHOTOSENSITIVE DIAZONAPHTHOQUINONE ESTERS BASED ON SELECTED CYCLIC ALKYL ETHER-CONTAINING PHENOLICS AND THEIR USE IN RADIATION SENSITIVE MIXTURES Arch Specialty Chemicals, Inc. (US) 2000-11-22 EP disclosed
US-6140026-A POSITIVE PATTERN IMAGES ON SUBSTRATES, COATING A BINDER RESIN WITH PHOTOSENSITIVE COMPOUND OF O-QUINONEDIAZIDESULFONIC ACID OF PHENOL ARCH SPECIALTY CHEMICALS, INC. (US) 2000-10-31 US disclosed
US-6040107-A POSITIVE PHOTORESISTS OLIN MICROELECTRONIC CHEMICALS, INC. (US) 2000-03-21 US disclosed
WO-1999040485-A1 PHOTOSENSITIVE DIAZONAPHTHOQUINONE ESTERS BASED ON SELECTED CYCLIC ALKYL ETHER-CONTAINING PHENOLICS AND THEIR USE IN RADIATION SENSITIVE MIXTURES OLIN MICROELECTRONIC CHEMICALS, INC. (US) 1999-08-12 WO disclosed
US-4663434-A Polycarbonates exhibiting improved heat resistance GENERAL ELECTRIC COMPANY (US) 1987-05-05 US disclosed
US-4576996-A BISPHENOL MONOMERS GENERAL ELECTRIC COMPANY (US) 1986-03-18 US disclosed
US-4520187-A ENGINEERING THERMOPLASTICS GENERAL ELECTRIC COMPANY (US) 1985-05-28 US disclosed