SCHEMBL7744950

SCHEMBL7744950

CCN(CC=O)c1cccc(C)c1.[BiH3]

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.43
CYP3A4 P08684 3/20 0.43
GFER P55789 1/20 0.41
MAPT P10636 4/20 0.40
LMNA P02545 3/20 0.40
USP2 O75604 1/20 0.40
CYP1A2 P05177 2/20 0.40
CYP2D6 P10635 2/20 0.40
CYP2C19 P33261 2/20 0.40
HPGD P15428 4/20 0.39
TDP1 Q9NUW8 1/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
TSHR P16473 2/20 0.39
ALOX15 P16050 1/20 0.39
HSD17B10 Q99714 1/20 0.39
TP53 P04637 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
KDM4E B2RXH2 1/20 0.39
HTT P42858 3/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11700574 0.98 ALDH1A1 (0.44) ALDH1A1CYP3A4GFERMAPTLMNA
SCHEMBL9292809 0.90 RECQL (0.41) ALDH1A1CYP3A4GFERMAPTLMNA
SCHEMBL30565134 0.82 ALDH1A1 (0.61) ALDH1A1CYP3A4GFERMAPTLMNA
SCHEMBL457496 0.82 ALDH1A1 (0.61) ALDH1A1CYP3A4GFERMAPTLMNA
SCHEMBL29082976 0.81 ALDH1A1 (0.44) ALDH1A1CYP3A4GFERMAPTLMNA
Lithium Ion SCHEMBL19732664 0.80 ALDH1A1 (0.59) ALDH1A1CYP3A4GFERMAPTLMNA
Hydrochloric Acid SCHEMBL8958612 0.80 ALDH1A1 (0.59) ALDH1A1CYP3A4GFERMAPTLMNA
SCHEMBL21065767 0.80 ALDH1A1 (0.59) ALDH1A1CYP3A4GFERMAPTLMNA
SCHEMBL9365623 0.78 ALDH1A1 (0.52) ALDH1A1CYP3A4GFERMAPTLMNA
SCHEMBL8380659 0.78 TSHR (0.53) ALDH1A1CYP3A4GFERMAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1030855-A4 BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH ADVANCED TECH MATERIALS (US) 2001-03-21 EP disclosed
EP-1030855-A1 BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2000-08-30 EP disclosed
US-5902639-A LIQUID DELIVERY VAPORIZATION OF A BISMUTH AMIDE SOURCE REAGENT TO FORM A BISMUTH-CONTAINING SOURCE VAPOR, AND DEPOSITION ON THE SUBSTRATE OF BISMUTH FROM THE BISMUTH-CONTAINING SOURCE VAPOR TO FORM THE BISMUTH LAYERBISMUTH-CONTAINING MATERIAL ADVANCED TECHNOLOGY MATERIALS, INC (US) 1999-05-11 US disclosed
WO-1998043988-A1 BISMUTH AMIDE COMPOUNDS AND COMPOSITIONS, AND METHOD OF FORMING BISMUTH-CONTAINING FILMS THEREWITH ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1998-10-08 WO disclosed