SCHEMBL7745946

SCHEMBL7745946

C=CC(=O)[N]C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1263460 0.67
SCHEMBL1017647 0.65
SCHEMBL456369 0.63
SCHEMBL476776 0.63
Acrylic Acid SCHEMBL3026856 0.63 LMNA (0.71)
SCHEMBL2284156 0.63
Acrylic Acid SCHEMBL30539473 0.63 LMNA (0.71)
SCHEMBL5457739 0.63
SCHEMBL4893426 0.63
Acrylic Acid SCHEMBL8741440 0.63 LMNA (0.71)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180818-B1 COMPOUND PROVIDING IMPROVED STORAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 2001-01-30 US disclosed
US-6114570-A IMPROVING THE STORABILITY OF A LATENT IMAGE AND AN EMULSIONS FUJI PHOTO FILM CO., LTD. (JP) 2000-09-05 US disclosed
US-5851754-A Silver halide photographic material and hydroxamic acid-base compound for use therein FUJI PHOTO FILM CO., LTD. (JP) 1998-12-22 US disclosed
EP-0597476-B1 Silver halide photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 1996-06-19 EP disclosed
US-5405739-A Containing a macrocyclic compound and a metal; storage stability KONICA CORPORATION (JP) 1995-04-11 US disclosed
EP-0601393-A1 Silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1994-06-15 EP disclosed
EP-0597476-A1 Silver halide photographic light-sensitive material KONICA CORPORATION (JP) 1994-05-18 EP disclosed