Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1722632 | 0.82 | MAPT (0.50) | THRBCYP3A4CYP2C9CYP2C19ALDH1A1 | |
| SCHEMBL20603026 | 0.82 | MAPT (0.50) | THRBCYP3A4CYP2C9CYP2C19ALDH1A1 | |
| SCHEMBL11144603 | 0.79 | THRB (0.37) | THRBCYP3A4CYP2C9CYP2C19MAPT | |
| SCHEMBL1735458 | 0.77 | KMT2A (0.38) | — | |
| SCHEMBL644021 | 0.77 | KMT2A (0.42) | — | |
| SCHEMBL8177320 | 0.77 | THRB (0.41) | THRBCYP3A4CYP2C9CYP2C19ALDH1A1 | |
| SCHEMBL17803500 | 0.77 | THRB (0.38) | THRBCYP3A4CYP2C9CYP2C19ALDH1A1 | |
| SCHEMBL18706310 | 0.77 | THRB (0.38) | THRBCYP3A4CYP2C9CYP2C19ALDH1A1 | |
| SCHEMBL15236714 | 0.77 | THRB (0.41) | THRBCYP3A4CYP2C9CYP2C19ALDH1A1 | |
| SCHEMBL10413570 | 0.77 | POLB (0.49) | THRBCYP3A4CYP2C9CYP2C19ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6329125-B2 | AN ALKALI-INSOLUBLE COMPOUND HAVING A PROTECTED ALKALI SOLUBLE GROUP IN WHICH PROTECTIVE GROUP CONTAINS AN ALICYCLIC HYDROCARBON GROUP HAVING BONDED TO A CARBON ATOM AND CLEAVED UPON ACTION OF AN ACID GENERATED FROM A PHOTOACID GEENERATOR | FUJITSU LIMITED (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010003640-A1 | Chemically amplified resist compositions and process for the formation of resist patterns | FUJITSU LIMITED (JP) | 2001-06-14 | — | — | US | disclosed |
| US-6200725-B1 | A SUBSTITUTED ALICYCLIC HYDROCARBON GROUP WHICH ACTS AS A PROTECTIVE GROUP TO AN ADDITIONAL POLYMER WHEN EXPOSED TO A POLYACID GENERATOR WHICH IS CAPABLE OF DECOMPOSING TO PATTERN RADIATION EPOSURE, PRODUCES ACID, CAPABLE OF DEPROTECTION | FUJITSU LIMITED (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6013416-A | FILMS FOR PHOTORESISTS PATTERNS | FUJITSU LIMITED (JP) | 2000-01-11 | — | — | US | disclosed |
| US-5968713-A | ALKALI DEVELOPED RESISTS AND FILM FORMING COMPOUNDS WITH ALKALI SOLUBLE GROUPS AND GENERATION | FUJITSU LIMITED (JP) | 1999-10-19 | — | — | US | disclosed |
| US-5910392-A | ACRYLATE COPOLYMERS | FUJITSU LIMITED (JP) | 1999-06-08 | — | — | US | disclosed |
| US-5665518-A | CARBOXY-SUBSTITUTED, BRIDGED CARBOCYCLIC (METH)ACRYLATE DERIVATIVE MONOMERS; TRANSPARENCY, RESOLUTION, SOLUBILITY, AND DRY-ETCHING RESISTANCE; SEMICONDUCTORS | NEC CORPORATION (JP) | 1997-09-09 | — | — | US | disclosed |