SCHEMBL775013

SCHEMBL775013

CCC(C[SiH](OC)OC)N(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775976 0.80
SCHEMBL1879920 0.79
SCHEMBL1068077 0.79
SCHEMBL963720 0.79 SLC6A4 (0.30)
SCHEMBL472005 0.74
SCHEMBL1069206 0.72
SCHEMBL5948653 0.71 FDPS (0.35)
SCHEMBL20560871 0.69
SCHEMBL15397866 0.69
Ammonia Solution, Strong SCHEMBL15135569 0.68 FDPS (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8709959-B2 Puncture resistant fabric KIMBERLY-CLARK WORLDWIDE, INC. (US) 2014-04-29 US claimed
US-12606576-B2 Method for producing nitrogen-containing organoxysilane compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-21 US disclosed
EP-4620960-A1 COMPOSITION CONTAINING AMINOALKYL ALKOXY DISILOXANE COMPOUND AND AMINOALKYL ALKOXY OLIGOSILOXANE COMPOUND, AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-24 EP disclosed
US-12018123-B2 Diterminally amine-modified perfluoropolyether compound and preparation thereof, and liquid-repelling composition, cured product and coated substrate containing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-06-25 US disclosed
EP-4006042-B1 METHOD FOR PRODUCING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND SHINETSU CHEMICAL CO (JP) 2024-01-31 EP disclosed
EP-3950774-B1 DITERMINALLY AMINE-MODIFIED PERFLUOROPOLYETHER COMPOUND AND PREPARATION THEREOF, AND LIQUID-REPELLING COMPOSITION, CURED PRODUCT AND COATED SUBSTRATE CONTAINING THE SAME SHINETSU CHEMICAL CO (JP) 2022-10-05 EP disclosed
CN-114573630-A Method for producing nitrogen-containing organooxysilane compound 信越化学工业株式会社 2022-06-03 CN disclosed
US-20220169665-A1 METHOD FOR PRODUCING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-02 US disclosed
EP-4006042-A1 METHOD FOR PRODUCING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-01 EP disclosed
EP-3950774-A1 DITERMINALLY AMINE-MODIFIED PERFLUOROPOLYETHER COMPOUND AND PREPARATION THEREOF, AND LIQUID-REPELLING COMPOSITION, CURED PRODUCT AND COATED SUBSTRATE CONTAINING THE SAME Shin-Etsu Chemical Co., Ltd. (JP) 2022-02-09 EP disclosed
US-7972682-B2 Reactive silicic acid suspensions WACKER CHEMIE AG (DE) 2011-07-05 US disclosed
US-20110159759-A1 Puncture Resistant Fabric KIMBERLY-CLARK WORLDWIDE, INC. 2011-06-30 US disclosed
US-20110155141-A1 Wearable Article That Stiffens Upon Sudden Force KIMBERLY-CLARK WORLDWIDE, INC. 2011-06-30 US disclosed
US-20110000658-A1 HYDROPHILIC MEMBER FUJIFILM CORPORATION (JP) 2011-01-06 US disclosed
EP-2239137-A1 HYDROPHILIC MEMBERS FUJIFILM Corporation (JP) 2010-10-13 EP disclosed
US-20090260297-A1 Hydrophilic and hydrophobic silane surface modification of abrasive grains SAINT-GOBAIN ABRASIFS (FR) 2009-10-22 US disclosed
WO-2009129384-A2 HYDROPHILIC AND HYDROPHOBIC SILANE SURFACE MODIFICATION OF ABRASIVE GRAINS SAINT-GOBAIN ABRASIVES, INC. (US) 2009-10-22 WO disclosed
US-20080113162-A1 Reactive Silicic Acid Suspensions WACKER CHEMIE AG (DE) 2008-05-15 US disclosed
US-6800413-B2 LOADING/REACTING HYDROPHILIC PYROGENIC SILICA WITH SILYLATING AGENT (METHYLTRICHLOROSILANE), THEN PURIFYING WITH INERT GAS WACKER-CHEMIE GMBH (DE) 2004-10-05 US disclosed
US-20030138715-A1 Low-silanol silica WACKER-CHEMIE GMBH (DE) 2003-07-24 US disclosed