Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Alcohol SCHEMBL4436479 | 0.88 | ALDH1A1 (0.38) | ALDH1A1 | |
| SCHEMBL9169132 | 0.85 | — | — | |
| SCHEMBL5509975 | 0.85 | — | — | |
| Water SCHEMBL28099894 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL28329543 | 0.82 | — | — | |
| SCHEMBL11798963 | 0.81 | — | — | |
| SCHEMBL2058397 | 0.80 | — | — | |
| Propylamine SCHEMBL8387198 | 0.78 | — | — | |
| Acetic Acid SCHEMBL27501735 | 0.78 | ALDH1A1 (0.39) | ALDH1A1 | |
| Propanol SCHEMBL7746581 | 0.77 | ALDH1A1 (0.36) | ALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0675412-B1 | Photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| US-5861232-A | FLEXOGRAPHIC PLATE | NIPPON PAINT CO., LTD. (JP) | 1999-01-19 | — | — | US | disclosed |
| EP-0745900-B1 | Water-developing photosensitive resin composition | NIPPON PAINT CO LTD (JP) | 1998-12-30 | — | — | EP | disclosed |
| US-5736298-A | COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-04-07 | — | — | US | disclosed |
| US-5731129-A | Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-03-24 | — | — | US | disclosed |
| EP-0745900-A1 | Water-developing photosensitive resin composition | Nippon Paint Co., Ltd. (JP) | 1996-12-04 | — | — | EP | disclosed |
| EP-0607962-B1 | Photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-07-17 | — | — | EP | disclosed |
| EP-0675412-A1 | Photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-10-04 | — | — | EP | disclosed |
| EP-0607962-A1 | Photosensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-07-27 | — | — | EP | disclosed |