SCHEMBL775279

SCHEMBL775279

C=C(C)C(=O)OCC(=O)N1C(=O)C2CC3CCCC3CC21

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
F2 P00734 2/20 0.34
ALDH1A1 P00352 1/20 0.32
KMT2A Q03164 1/20 0.31
HTT P42858 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775162 0.88 F2 (0.34) F2ALDH1A1
SCHEMBL775168 0.88 F2 (0.36) F2ALDH1A1
SCHEMBL774995 0.86 ALDH1A1 (0.36) F2ALDH1A1KMT2AHTTL3MBTL1
SCHEMBL775415 0.86 F2 (0.33) F2ALDH1A1
SCHEMBL774853 0.84 ALDH1A1 (0.34) F2ALDH1A1KMT2A
SCHEMBL9915987 0.83 HTT (0.36) F2ALDH1A1KMT2AHTT
SCHEMBL775401 0.82 ALDH1A1 (0.33) F2ALDH1A1KMT2A
SCHEMBL9915991 0.82 HTT (0.35) F2ALDH1A1KMT2AHTT
SCHEMBL9915990 0.82 HTT (0.35) F2ALDH1A1KMT2AHTT
SCHEMBL775043 0.81 HTT (0.31) F2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed
US-20120070778-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-03-22 US disclosed