⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1572578 | 0.83 | LMNA (0.47) | — | |
| SCHEMBL9753776 | 0.82 | — | — | |
| SCHEMBL28457220 | 0.79 | LMNA (0.32) | — | |
| SCHEMBL28729680 | 0.79 | — | — | |
| SCHEMBL14764616 | 0.78 | LMNA (0.35) | — | |
| SCHEMBL2090998 | 0.77 | — | — | |
| SCHEMBL21835898 | 0.77 | — | — | |
| SCHEMBL28494290 | 0.77 | — | — | |
| SCHEMBL8875788 | 0.77 | MAPK1 (0.35) | — | |
| SCHEMBL16371667 | 0.77 | NR2E1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-117567265-A | Fluorine-containing polyether carboxylic acid and preparation method and application thereof | 天津市长芦化工新材料有限公司 | 2024-02-20 | — | — | CN | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305392-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| US-20230266666-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-24 | — | — | US | disclosed |
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-26 | — | — | US | disclosed |
| US-20080108850-A1 | Addition-condensation copolymers containing polyoxyethylene glycol; high viscosity; used as lubricating oil for compression refrigerator | IDEMITSU KOSAN CO., LTD. (JP) | 2008-05-08 | — | — | US | disclosed |
| EP-1059279-B1 | Polyvinyl ether compound and method of preperation | IDEMITSU KOSAN CO (JP) | 2005-08-17 | — | — | EP | disclosed |
| EP-1059279-A1 | Polyvinyl ether compound and method of preperation | IDEMITSU KOSAN CO., LTD. (JP) | 2000-12-13 | — | — | EP | disclosed |
| EP-0644175-B1 | POLYVINYL ETHER COMPOUND AND LUBRICATING OIL | IDEMITSU KOSAN CO (JP) | 1999-10-20 | — | — | EP | disclosed |
| US-5616812-A | POLYMERIZING VINYL ETHER IN THE PRESENCE OF CATALYST AND SPECIFIC ACETAL | IDEMITSU KOSAN CO., LTD. (JP) | 1997-04-01 | — | — | US | disclosed |
| US-5589597-A | HYDROGENATION | IDEMITSU KOSAN CO., LTD. (JP) | 1996-12-31 | — | — | US | disclosed |
| US-5523491-A | REACTING ACETAL OR KETAL COMPOUND WITH HYDROGEN IN PRESENCE OF HYDROGENATION AND SOLID ACID CATALYSTS | IDEMITSU KOSAN CO., LTD. (JP) | 1996-06-04 | — | — | US | disclosed |
| EP-0644175-A1 | POLYVINYL ETHER COMPOUND AND LUBRICATING OIL | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1995-03-22 | — | — | EP | disclosed |
| US-5399631-A | Polyvinyl ether compound | IDEMITSU KOSAN CO., LTD. (JP) | 1995-03-21 | — | — | US | disclosed |
| EP-0219091-B1 | PYRAN DERIVATIVES AND PROCESS FOR THEIR PREPARATION | BASF Aktiengesellschaft (DE) | 1989-04-26 | — | — | EP | disclosed |