⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL780274 | 0.89 | — | — | |
| SCHEMBL1116074 | 0.89 | — | — | |
| SCHEMBL3128131 | 0.80 | — | — | |
| SCHEMBL7148695 | 0.80 | — | — | |
| SCHEMBL910586 | 0.80 | — | — | |
| SCHEMBL578897 | 0.80 | — | — | |
| SCHEMBL6657283 | 0.80 | — | — | |
| SCHEMBL18395329 | 0.80 | — | — | |
| SCHEMBL6291539 | 0.80 | — | — | |
| SCHEMBL472234 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2001050509-A1 | HIGH DIELECTRIC CONSTANT MATERIAL DEPOSITION TO ACHIEVE HIGH CAPACITANCE | INFINEON TECHNOLOGIES NORTH AMERICA CORP. (US) | 2001-07-12 | — | — | WO | disclosed |
| US-6207584-B1 | High dielectric constant material deposition to achieve high capacitance | INTERNATIONAL BUSINESS MACHINES CORP. | 2001-03-27 | — | — | US | disclosed |