SCHEMBL7756701

SCHEMBL7756701

C=C(C)OC(=O)C(Cl)(Cl)Cl

nearest known ligand 0.50

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
ALDH1A1 P00352 3/20 0.32
TSHR P16473 2/20 0.32
TP53 P04637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11336149 0.80 HSD17B10 (0.46) HSD17B10TDP1
SCHEMBL150680 0.78 ALDH1A1 (0.50) HSD17B10TDP1ALDH1A1TSHRTP53
SCHEMBL150679 0.76 ALDH1A1 (0.44) ALDH1A1TSHRTP53
SCHEMBL1417405 0.76 TDP1 (0.52) HSD17B10TDP1ALDH1A1TSHR
SCHEMBL28970860 0.76 ALDH1A1 (0.47) HSD17B10TDP1ALDH1A1TSHRTP53
SCHEMBL7127945 0.76 TDP1 (0.52) HSD17B10TDP1ALDH1A1TSHR
SCHEMBL16037456 0.76 ALDH1A1 (0.33) ALDH1A1TSHRTP53
SCHEMBL7756692 0.74 HSD17B10 (0.50) HSD17B10TDP1ALDH1A1TSHR
SCHEMBL28821507 0.74 ALDH1A1 (0.41) ALDH1A1TSHRTP53
SCHEMBL28329124 0.74 ALDH1A1 (0.41) ALDH1A1TSHRTP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4268607-A Method of patterning a resist layer for manufacture of a semiconductor element VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) 1981-05-19 US claimed
US-6310225-B1 USEFUL AS INTERMEDIATES FOR PRODUCING VITAMIN D DERIVATES KURARAY CO., LTD. (JP) 2001-10-30 US disclosed
EP-1081157-A1 PROCESSES FOR THE PREPARATION OF STEROID DERIVATIVES, INTERMEDIATES THEREFOR AND PROCESSES FOR THE PREPARATION OF THE INTERMEDIATES Kuraray Co., Ltd. (JP) 2001-03-07 EP disclosed
US-4268607-A Method of patterning a resist layer for manufacture of a semiconductor element VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) 1981-05-19 US disclosed