⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL109737 | 0.87 | — | — | |
| SCHEMBL4848570 | 0.75 | — | — | |
| SCHEMBL5444913 | 0.75 | — | — | |
| SCHEMBL2058809 | 0.75 | — | — | |
| SCHEMBL1187518 | 0.75 | — | — | |
| SCHEMBL4101179 | 0.75 | — | — | |
| SCHEMBL1531126 | 0.75 | — | — | |
| SCHEMBL9444701 | 0.75 | — | — | |
| Methane SCHEMBL16671598 | 0.75 | — | — | |
| SCHEMBL934027 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116732489-B | Monitoring system, thin film deposition system and method for manufacturing thin film product | 上海传芯半导体有限公司 | 2024-05-03 | — | — | CN | claimed |
| CN-116732489-A | Monitoring system, thin film deposition system and method for manufacturing thin film product | 上海传芯半导体有限公司 | 2023-09-12 | — | — | CN | claimed |
| CN-105659360-B | Include molybdenum nitride, the semiconductor structure of nitrogen oxidation molybdenum or the alloy material based on molybdenum and its manufacturing method | 美光科技公司 | 2019-02-01 | — | — | CN | claimed |
| CN-107526246-A | MASK SUBSTRATE STRUCTURE | 格罗方德半导体公司 | 2017-12-29 | — | — | CN | claimed |
| CN-105659360-A | Semiconductor device and manufacturing method of the same | 美光科技公司 | 2016-06-08 | — | — | CN | claimed |
| CN-103681255-B | Double patterning method | NAN YA TECHNOLOGY CORP. (CN) | 2016-04-20 | — | — | CN | claimed |
| CN-105199379-A | Continuous long carbon fiber reinforced thermoplastic nanocomposite and preparation method and application thereof | BEIJING NASHENGTONG ADVANCED MATERIALS & TECHNOLOGY CO LTD | 2015-12-30 | — | — | CN | claimed |
| CN-103681255-A | double patterning method | NANYA TECHNOLOGY CORP | 2014-03-26 | — | — | CN | claimed |
| CN-102129165-B | Attenuation phase shift mask | SEMICONDUCTOR MFG INT SHANGHAI | 2012-12-05 | — | — | CN | claimed |
| CN-102129165-A | Attenuation phase shift mask | SEMICONDUCTOR MFG INT SHANGHAI | 2011-07-20 | — | — | CN | claimed |
| CN-116732489-B | Monitoring system, thin film deposition system and method for manufacturing thin film product | 上海传芯半导体有限公司 | 2024-05-03 | — | — | CN | disclosed |
| CN-117426570-A | Heating element | 深圳市卓力能技术有限公司 | 2024-01-23 | — | — | CN | disclosed |
| CN-116732489-A | Monitoring system, thin film deposition system and method for manufacturing thin film product | 上海传芯半导体有限公司 | 2023-09-12 | — | — | CN | disclosed |
| CN-218474092-U | Heating body | 深圳市卓力能技术有限公司 | 2023-02-14 | — | — | CN | disclosed |
| CN-115190658-A | Silicon nitride heating element and heating device | 衡阳凯新特种材料科技有限公司 | 2022-10-14 | — | — | CN | disclosed |
| CN-1142119-C | Composite material, preparation method thereof, thermistor material composed of composite material and preparation method thereof | ��ʽ���������о��� | 2004-03-17 | — | — | CN | disclosed |
| JP-2001158667-A | SINTERED CERAMIC COMPOSITE | ROBERT BOSCH GMBH | 2001-06-12 | — | — | JP | disclosed |
| US-6245439-B1 | composite material and method for the manufacture | KABUSHIKI KAISHA TOYOYTA CHUO KENKYUSHO (JP) | 2001-06-12 | — | — | US | disclosed |
| CN-1131937-A | Composite material and method for producing same | TOYODA CHUO KENKYUSHO KK (JP) | 1996-09-25 | — | — | CN | disclosed |
| US-5402038-A | Method for reducing molybdenum oxidation in lamps | GENERAL ELECTRIC COMPANY (US) | 1995-03-28 | — | — | US | disclosed |