SCHEMBL776032

SCHEMBL776032

CCSC(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20528167 0.97 LMNA (0.33)
SCHEMBL3857082 0.97 LMNA (0.33)
SCHEMBL3863623 0.97 LMNA (0.33)
SCHEMBL776487 0.92
SCHEMBL20528162 0.84
SCHEMBL775722 0.79
SCHEMBL9431062 0.75 CES1 (0.35)
SCHEMBL776351 0.74
SCHEMBL9431472 0.74 CES1 (0.34)
SCHEMBL5976132 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12227721-B2 Hydrofluorothioethers and methods of using same 3M INNOVATIVE PROPERTIES COMPANY (US) 2025-02-18 US disclosed
US-12100809-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-24 US disclosed
CN-114502709-B Removal of electroluminescent material from a substrate 3M创新有限公司 2024-09-13 CN disclosed
US-20240297344-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-05 US disclosed
US-11920102-B2 Deposition compositions and methods of making and using same 3M INNOVATIVE PROPERTIES COMPANY (US) 2024-03-05 US disclosed
US-11616253-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2023-03-28 US disclosed
US-20220298454-A1 HYDROFLUOROTHIOETHERS AND METHODS OF USING SAME 3M INNOVATIVE PROPERTIES COMPANY 2022-09-22 US disclosed
US-20220278370-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2022-09-01 US disclosed
US-11367899-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2022-06-21 US disclosed
CN-114502709-A Removal of electroluminescent material from a substrate 3M创新有限公司 2022-05-13 CN disclosed
US-20150188192-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2015-07-02 US disclosed
US-20150056503-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2015-02-26 US disclosed
EP-1698644-B1 FLUORINE-CONTAINING PHOTOCURING COMPOSITION DAINIPPON INK & CHEMICALS (JP) 2013-02-27 EP disclosed
US-20120177988-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2012-07-12 US disclosed
US-20120070731-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2012-03-22 US disclosed
US-20090325065-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2009-12-31 US disclosed
US-7592405-B2 Fluorine-containing photocurable composition DIC CORPORATION (JP) 2009-09-22 US disclosed
EP-2012386-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY Mitsubishi Chemical Corporation (JP) 2009-01-07 EP disclosed
US-20070066779-A1 Fluorine-containing photocurable composition DIC CORPORATION (JP) 2007-03-22 US disclosed
EP-1698644-A1 FLUORINE-CONTAINING PHOTOCURING COMPOSITION DAINIPPON INK AND CHEMICALS, INC. (JP) 2006-09-06 EP disclosed