⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1532923 | 0.77 | — | — | |
| SCHEMBL31366858 | 0.75 | — | — | |
| SCHEMBL6855292 | 0.74 | LMNA (0.33) | — | |
| SCHEMBL29145792 | 0.72 | LMNA (0.38) | — | |
| SCHEMBL30743163 | 0.72 | LMNA (0.38) | — | |
| SCHEMBL366936 | 0.72 | LMNA (0.38) | — | |
| SCHEMBL28713357 | 0.72 | LMNA (0.38) | — | |
| SCHEMBL64546 | 0.72 | LMNA (0.38) | — | |
| SCHEMBL29145793 | 0.72 | LMNA (0.38) | — | |
| SCHEMBL26094 | 0.72 | LMNA (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0748362-B2 | PROCESS FOR PREPARING SILANIZED TiO 2 PIGMENTS USING A MEDIA MILL | DU PONT (US) | 2001-04-18 | — | — | EP | claimed |
| EP-0748362-B1 | PROCESS FOR PREPARING SILANIZED TiO 2 PIGMENTS USING A MEDIA MILL | DU PONT (US) | 1997-12-29 | — | — | EP | claimed |
| EP-0748362-A1 | PROCESS FOR PREPARING SILANIZED TiO 2 PIGMENTS USING A MEDIA MILL | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-12-18 | — | — | EP | claimed |
| US-5501732-A | Process for preparing silanized TiO2 pigments using a media mill | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-03-26 | — | — | US | claimed |
| WO-1995023194-A1 | PROCESS FOR PREPARING SILANIZED TiO2 PIGMENTS USING A MEDIA MILL | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-08-31 | — | — | WO | claimed |
| CN-116034127-B | Silicon-containing monomer mixture, polysiloxane, resin composition, photosensitive resin composition, cured film, method for producing cured film, pattern cured film, and method for producing pattern cured film | 中央硝子株式会社 | 2024-03-01 | — | — | CN | disclosed |
| US-11881400-B2 | Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-01-23 | — | — | US | disclosed |
| US-20230408922-A1 | APPLICATION LIQUID FOR OPTICAL MEMBER, POLYMER, PHOTOSENSITIVE APPLICATION LIQUID, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM, AND METHOD FOR PRODUCING POLYMER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-12-21 | — | — | US | disclosed |
| US-20230333468-A1 | RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR PRODUCING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN CURED FILM, METHOD FOR PRODUCING POLYMER, AND METHOD FOR PRODUCING RESIN COMPOSITION | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-10-19 | — | — | US | disclosed |
| CN-116601210-A | Resin composition, cured film, method for producing cured film, substrate with multilayer film, method for producing substrate with pattern, photosensitive resin composition, method for producing pattern cured film, method for producing polymer, and method for producing resin composition | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116601244-A | Coating liquid for optical member, polymer, cured film, photosensitive coating liquid, pattern cured film, optical member, solid-state imaging element, display device, silicone compound, stabilizer used in coating liquid, method for producing cured film, method for producing pattern cured film, and method for producing polymer | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| US-20230244145-A1 | SILICON-CONTAINING MONOMER MIXTURE, POLYSILOXANE, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PRODUCTION METHOD FOR CURED FILM, PATTERNED CURED FILM, AND PRODUCTION METHOD FOR PATTERNED CURED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20190002721-A1 | ELECTROSTATIC INK COMPOSITION | HP INDIGO B.V. (NL) | 2019-01-03 | — | — | US | disclosed |
| EP-3295252-A1 | ELECTROSTATIC INK COMPOSITION | HP INDIGO B.V. (NL) | 2018-03-21 | — | — | EP | disclosed |
| WO-2017063719-A1 | ELECTROSTATIC INK COMPOSITION | HEWLETT-PACKARD INDIGO B.V. (NL) | 2017-04-20 | — | — | WO | disclosed |
| EP-0748362-B2 | PROCESS FOR PREPARING SILANIZED TiO 2 PIGMENTS USING A MEDIA MILL | DU PONT (US) | 2001-04-18 | — | — | EP | disclosed |
| EP-0748362-B1 | PROCESS FOR PREPARING SILANIZED TiO 2 PIGMENTS USING A MEDIA MILL | DU PONT (US) | 1997-12-29 | — | — | EP | disclosed |
| EP-0748362-A1 | PROCESS FOR PREPARING SILANIZED TiO 2 PIGMENTS USING A MEDIA MILL | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-12-18 | — | — | EP | disclosed |
| US-5501732-A | Process for preparing silanized TiO2 pigments using a media mill | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-03-26 | — | — | US | disclosed |
| WO-1995023194-A1 | PROCESS FOR PREPARING SILANIZED TiO2 PIGMENTS USING A MEDIA MILL | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-08-31 | — | — | WO | disclosed |