⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7095754 | 0.82 | — | — | |
| SCHEMBL17474474 | 0.74 | — | — | |
| SCHEMBL575166 | 0.71 | — | — | |
| SCHEMBL17474472 | 0.70 | — | — | |
| SCHEMBL7094128 | 0.67 | — | — | |
| SCHEMBL575066 | 0.63 | — | — | |
| SCHEMBL17474482 | 0.61 | — | — | |
| SCHEMBL250373 | 0.61 | — | — | |
| SCHEMBL1470768 | 0.60 | — | — | |
| SCHEMBL1470118 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023153296-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| WO-2023153295-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| WO-2023153294-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| US-20220149436-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| US-20210384554-A1 | LITHIUM SECONDARY BATTERY ELECTROLYTE FOR REDUCING INTERNAL RESISTANCE OF BATTERY AND LITHIUM SECONDARY BATTERY | GUANGZHOU TINCI MATERIALS TECHNOLOGY CO., LTD. (CN) | 2021-12-09 | — | — | US | disclosed |
| EP-3819976-A1 | LITHIUM SECONDARY BATTERY ELECTROLYTE FOR REDUCING INTERNAL RESISTANCE OF BATTERY AND LITHIUM SECONDARY BATTERY | Guangzhou Tinci Materials Technology Co., Ltd (CN) | 2021-05-12 | — | — | EP | disclosed |
| EP-3621141-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2020-03-11 | — | — | EP | disclosed |
| US-20190229372-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-07-25 | — | — | US | disclosed |
| US-10333172-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2019-06-25 | — | — | US | disclosed |
| US-10290901-B2 | — | — | 2019-05-14 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| EP-1443042-A1 | HYBRID ONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-20040009310-A1 | Liquid crystal aligning agent, method of forming a liquid crystal alignment film and liquid crystal display element | JSR CORPORATION (JP) | 2004-01-15 | — | — | US | disclosed |
| EP-1353217-A1 | Optical alignment method and liquid crystal display element | JSR Corporation (JP) | 2003-10-15 | — | — | EP | disclosed |
| EP-1336636-A1 | Liquid crystal aligning agent,method of forming a liquid crystal alignment film and liquid crystal display element | JSR Corporation (JP) | 2003-08-20 | — | — | EP | disclosed |
| US-20030087045-A1 | Liquid crystal aligning agent and liquid crystal display element | JSR CORPORATION (JP) | 2003-05-08 | — | — | US | disclosed |
| US-20030065189-A1 | Processes for producing 4-substituted benzopyran derivatives | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2003-04-03 | — | — | US | disclosed |
| US-6455708-B1 | SUCH AS 2,2-BIS(FLUOROMETHYL)-N-(2-CYANOETHYL)-6-TRIFLUOROMETHYL-2H-1-BENZOPYRAN-4 -CARBOXAMIDE; USEFUL AS MEDICINES, AGRICHEMICALS AND COSMETICS, AND CHEMICAL INTERMEDIATES | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2002-09-24 | — | — | US | disclosed |
| EP-1120412-A1 | PROCESSES FOR THE PREPARATION OF 4-SUBSTITUTED BENZOPYRAN DERIVATIVES | CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) | 2001-08-01 | — | — | EP | disclosed |