SCHEMBL7774162

SCHEMBL7774162

Oc1cc2cccc3ccc4c5ccccc5[c]c1c4c32

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.49
ERBB2 P04626 1/20 0.49
FYN P06241 1/20 0.49
MAOA P21397 1/20 0.49
ACHE P22303 1/20 0.49
AHR P35869 1/20 0.49
ALDH1A1 P00352 6/20 0.40
HPGD P15428 4/20 0.40
HSD17B10 Q99714 4/20 0.40
THRB P10828 2/20 0.40
TRPM4 Q8TD43 1/20 0.37
MEN1 O00255 4/20 0.34
KMT2A Q03164 4/20 0.34
CYP3A4 P08684 3/20 0.33
TSHR P16473 2/20 0.33
CYP1A1 P04798 2/20 0.33
CYP1B1 Q16678 2/20 0.33
PTPN22 Q9Y2R2 1/20 0.33
DNMT1 P26358 1/20 0.33
CACNA1B Q00975 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6742211 0.79 CYP1A2 (0.50) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL18546810 0.79 HSD17B10 (0.57) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL55779 0.75 HSD17B10 (0.50) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL6050883 0.72 CYP1A2 (0.39) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL7996318 0.72 CYP1A2 (0.67) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL864719 0.71 CYP1A2 (0.55) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL2047161 0.70 CYP1A2 (0.57) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL29589319 0.70 CYP1A2 (0.57) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL27923136 0.69 CYP1A2 (0.47) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL7861352 0.69 CYP1A2 (0.40) CYP1A2ERBB2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11214678-B2 Hardmask composition, hardmask layer and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-04 US claimed
CN-111378084-B Polymer and hardmask composition and method of forming pattern 三星SDI株式会社 2023-08-08 CN disclosed
US-11220570-B2 Polymer, hardmask composition, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-11 US disclosed
US-11214678-B2 Hardmask composition, hardmask layer and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2022-01-04 US disclosed
US-20200207902-A1 POLYMER, HARDMASK COMPOSITION, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2020-07-02 US disclosed
US-20200201185-A1 HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2020-06-25 US disclosed
US-6248870-B1 OLIGO-2,6-PYRIMIDINE COMPLEXING AGENT. NYCOMED IMAGING AS (NO) 2001-06-19 US disclosed
US-5817774-A Unsymmetrical complexing agents and targeting immunoreagents useful in therapeutic and diagnostic compositions and methods STERLING WINTHROP INCORPORATION (US) 1998-10-06 US disclosed
US-5559214-A Unsymmetrical complexing agents and targeting immunoreagents useful in thearpeutic and diagnostic compositions and methods STERLING WINTHROP INC. (US) 1996-09-24 US disclosed