Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.39 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.39 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.39 |
| ▸ | PGR | P06401 | 1/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.39 |
| ▸ | HTR1A | P08908 | 1/20 | 0.39 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.39 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.39 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.39 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.39 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.39 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.39 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propane SCHEMBL9161378 | 0.95 | MAPT (0.46) | MAPTTDP1ALDH1A1LMNAHSD17B10 | |
| Methoxymethane SCHEMBL10899414 | 0.95 | MAPT (0.41) | MAPTTDP1ALDH1A1LMNAHSD17B10 | |
| SCHEMBL2152767 | 0.95 | — | — | |
| SCHEMBL2152842 | 0.95 | — | — | |
| SCHEMBL36039 | 0.95 | — | — | |
| Acetic Acid Methyl Ester SCHEMBL8061108 | 0.93 | ALDH1A1 (0.48) | MAPTTDP1ALDH1A1LMNAHSD17B10 | |
| Methyl Alcohol SCHEMBL5153424 | 0.92 | MAPT (0.45) | MAPTTDP1ALDH1A1LMNAHSD17B10 | |
| Water SCHEMBL4453682 | 0.92 | — | — | |
| Methane SCHEMBL17727999 | 0.92 | — | — | |
| SCHEMBL15333060 | 0.91 | MAPT (0.41) | MAPTTDP1ALDH1A1LMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6167 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12517047-B2 | Transport and detection of explosive samples | ALTI LLC (US) | 2026-01-06 | — | — | US | claimed |
| US-20260005089-A1 | MICROELECTRONIC DEVICE | VISERA TECHNOLOGIES CO LTD (TW) | 2026-01-01 | — | — | US | claimed |
| US-20250375743-A1 | POROUS POLYETHYLENE FILTER MEMBRANE WITH ASYMMETRIC PORE STRUCTURE, AND RELATED FILTERS AND METHODS | ENTEGRIS INC (US) | 2025-12-11 | — | — | US | claimed |
| US-12480021-B2 | Composition for semiconductor process, method for preparing the same and method for preparing semiconductor device using the same | SK ENPULSE CO., LTD. (KR) | 2025-11-25 | — | — | US | claimed |
| US-20250357138-A1 | FORMATION OF SELF-ASSEMBLED MONOLAYER FOR SELECTIVE ETCHING PROCESS | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-11-20 | — | — | US | claimed |
| US-20250344558-A1 | OPTICALLY ACTIVE STRUCTURES AND PROCESSES FOR PREPARING AND DEVICES THEREOF | EDISON INNOVAIONS LLC (US) | 2025-11-06 | — | — | US | claimed |
| US-20250304819-A1 | Flexible and foldable abrasion resistant photopatternable siloxane hard coat | OPTITUNE OY (FI) | 2025-10-02 | — | — | US | claimed |
| US-20250291241-A1 | HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2025-09-18 | — | — | US | claimed |
| US-12409422-B2 | Composite hollow fiber and related methods and products | ENTEGRIS, INC. (US) | 2025-09-09 | — | — | US | claimed |
| US-20250250378-A1 | CYANONORBORNENE POLYMERS FOR OIL RESISTANT PHOTOIMAGEABLE COMPOSITIONS | PROMERUS, LLC (US) | 2025-08-07 | — | — | US | claimed |
| EP-0778292-A2 | Method for the production of anhydride modified polyvinyl acetals useful for photosensitive compositions | Bayer Corporation (US) | 1997-06-11 | — | — | EP | claimed |
| US-5595855-A | PHOTORESISTS | HOECHST JAPAN LIMITED (JP) | 1997-01-21 | — | — | US | claimed |
| EP-0752244-A1 | Cosmetic compositions comprising a film-forming polymer, process for its preparation and use | L'OREAL (FR) | 1997-01-08 | — | — | EP | claimed |
| US-5399462-A | Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1995-03-21 | — | — | US | claimed |
| US-5358823-A | A mixture of partial and complete esters | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-10-25 | — | — | US | claimed |
| EP-0599762-A1 | Method of forming sub-half micron patterns with optical lithography using bilayer resist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-06-01 | — | — | EP | claimed |
| EP-0306991-B1 | A method for making 1-alkene/excess maleic anhydride polymers | JOHNSON & SON INC S C (US) | 1993-11-10 | — | — | EP | claimed |
| US-4859752-A | Alkene/excess maleic anhydride polymer manufacture | S. C. JOHNSON & SON, INC. (US) | 1989-08-22 | — | — | US | claimed |
| EP-0306991-A2 | A method for making 1-alkene/excess maleic anhydride polymers | S.C. JOHNSON & SON, INC. (US) | 1989-03-15 | — | — | EP | claimed |
| US-4621042-A | O-CRESOL NOVOLAC RESIN | RCA CORPORATION (US) | 1986-11-04 | — | — | US | claimed |