SCHEMBL7780206

SCHEMBL7780206

CCOC(O)(CC)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27761035 0.80
SCHEMBL1408820 0.78
SCHEMBL8620585 0.77
SCHEMBL927621 0.77
SCHEMBL29492 0.70
SCHEMBL11680099 0.70 GAA (0.38)
SCHEMBL27590442 0.68
SCHEMBL3150356 0.67
SCHEMBL7729508 0.67
SCHEMBL3170284 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0718695-B1 Water-developable photosensitive resin composition NIPPON PAINT CO LTD (JP) 2001-09-19 EP disclosed
US-5837421-A POLYMERS FOR FLEXOGRAPHIC PRINTING PLATES MADE FROM DIENE MONOMERS AND ACRYLATE MONOMERS FOR IMPACT STRENGTH NIPPON PAINT CO., LTD. (JP) 1998-11-17 US disclosed
EP-0718695-A2 Water-developable photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-06-26 EP disclosed