⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7780206 | 0.78 | — | — | |
| SCHEMBL27761035 | 0.74 | — | — | |
| SCHEMBL5441236 | 0.71 | — | — | |
| SCHEMBL927621 | 0.71 | — | — | |
| SCHEMBL7179939 | 0.70 | ALDH1A1 (0.33) | — | |
| SCHEMBL6238385 | 0.70 | ALDH1A1 (0.33) | — | |
| SCHEMBL6887437 | 0.69 | ALDH1A1 (0.32) | — | |
| SCHEMBL10711783 | 0.69 | ALDH1A1 (0.32) | — | |
| SCHEMBL9048508 | 0.67 | ALDH1A1 (0.31) | — | |
| SCHEMBL9700112 | 0.67 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2295438-B2 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND | TOSOH CORP (JP) | 2025-03-26 | — | — | EP | claimed |
| EP-2295438-B1 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND | TOSOH CORP (JP) | 2015-03-18 | — | — | EP | claimed |
| US-20110077376-A1 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING IT | TOSOH CORPORATION (JP) | 2011-03-31 | — | — | US | claimed |
| EP-2295438-A1 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND | Tosoh Corporation (JP) | 2011-03-16 | — | — | EP | claimed |
| EP-0489553-B1 | Photosensitive polymeric printing medium and water developable printing plates | NAPP SYSTEMS INC (US) | 1997-05-28 | — | — | EP | claimed |
| US-5348844-A | Domains of latex and elastomer bound by photopolymerizable compounds filling interstices, flexography | NAPP SYSTEMS, INC. (US) | 1994-09-20 | — | — | US | claimed |
| EP-0489553-A1 | Photosensitive polymeric printing medium and water developable printing plates | NAPP SYSTEMS INC. (US) | 1992-06-10 | — | — | EP | claimed |
| EP-4190832-B1 | POLYISOCYANATE COMPOSITION, COATING COMPOSITION AND COATED SUBSTRATE | ASAHI CHEMICAL IND (JP) | 2026-04-08 | — | — | EP | disclosed |
| US-20250270376-A1 | FILM FOR LATEX INK | LINTEC CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| EP-4328273-B1 | BLOCKED ISOCYANATE COMPOSITION, AQUEOUS DISPERSION, COATING COMPOSITION AND COATING FILM | ASAHI CHEMICAL IND (JP) | 2025-06-25 | — | — | EP | disclosed |
| EP-2295438-B2 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND | TOSOH CORP (JP) | 2025-03-26 | — | — | EP | disclosed |
| EP-4177065-B1 | FILM FOR LATEX INK | LINTEC CORP (JP) | 2025-03-19 | — | — | EP | disclosed |
| WO-2025053151-A1 | LAMINATE | 王子ホールディングス株式会社 | 2025-03-13 | — | — | WO | disclosed |
| EP-1108514-A1 | METHOD FOR PRODUCING THERMALLY INSULATING PLATE | ASAHI GLASS COMPANY LTD. (JP) | 2001-06-20 | — | — | EP | disclosed |
| EP-0489553-B1 | Photosensitive polymeric printing medium and water developable printing plates | NAPP SYSTEMS INC (US) | 1997-05-28 | — | — | EP | disclosed |
| US-5348844-A | Domains of latex and elastomer bound by photopolymerizable compounds filling interstices, flexography | NAPP SYSTEMS, INC. (US) | 1994-09-20 | — | — | US | disclosed |
| EP-0261910-B1 | Water-developable photosensitive plate and its production | NIPPON PAINT CO LTD (JP) | 1994-03-30 | — | — | EP | disclosed |
| US-5175076-A | Copolymer resin for light sensitive elements of diene, alpha, beta-unsaturated carboxylic acids and vinyl monomers, a basic nitrogen compound and an unsaturated monomer | NIPPON PAINT CO., LTD. (JP) | 1992-12-29 | — | — | US | disclosed |
| EP-0489553-A1 | Photosensitive polymeric printing medium and water developable printing plates | NAPP SYSTEMS INC. (US) | 1992-06-10 | — | — | EP | disclosed |
| WO-1988002135-A1 | WATER-DEVELOPABLE PHOTOSENSITIVE PLATE AND ITS PRODUCTION | NAPP SYSTEMS (USA), INC. (US) | 1988-03-24 | — | — | WO | disclosed |