⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30474361 | 0.87 | — | — | |
| SCHEMBL6471971 | 0.87 | — | — | |
| SCHEMBL2170354 | 0.82 | — | — | |
| SCHEMBL6839937 | 0.82 | — | — | |
| SCHEMBL30577787 | 0.82 | — | — | |
| SCHEMBL1188574 | 0.82 | — | — | |
| SCHEMBL7774126 | 0.82 | — | — | |
| SCHEMBL4305933 | 0.82 | — | — | |
| SCHEMBL108635 | 0.82 | — | — | |
| SCHEMBL30366848 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12580134-B2 | Electrolytic capacitor element having a doped solid electrolyte layer | MURATA MANUFACTURING CO., LTD. (JP) | 2026-03-17 | — | — | US | disclosed |
| US-12573562-B2 | Solid electrolytic capacitor element, solid electrolytic capacitor, and method for manufacturing solid electrolytic capacitor element | MURATA MANUFACTURING CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| US-12476054-B2 | Solid electrolytic capacitor element having a negative conductor layer that does not cover a part of a carbon layer, and solid electrolytic capacitor | MURATA MANUFACTURING CO., LTD. (JP) | 2025-11-18 | — | — | US | disclosed |
| US-12424392-B2 | Electrolytic capacitor and method for manufacturing electrolytic capacitor | MURATA MANUFACTURING CO., LTD. (JP) | 2025-09-23 | — | — | US | disclosed |
| US-12308183-B2 | Solid electrolytic capacitor | MURATA MANUFACTURING CO., LTD. (JP) | 2025-05-20 | — | — | US | disclosed |
| US-20250149259-A1 | SOLID ELECTROLYTIC CAPACITOR ELEMENT, SOLID ELECTROLYTIC CAPACITOR, AND SOLID ELECTROLYTIC CAPACITOR ELEMENT MANUFACTURING METHOD | MURATA MANUFACTURING CO., LTD. (JP) | 2025-05-08 | — | — | US | disclosed |
| CN-119487595-A | Solid electrolytic capacitor element, solid electrolytic capacitor, and method for manufacturing solid electrolytic capacitor element | 株式会社村田制作所 | 2025-02-18 | — | — | CN | disclosed |
| US-12087515-B2 | Electrolytic capacitor and method for manufacturing electrolytic capacitor | MURATA MANUFACTURING CO., LTD. (JP) | 2024-09-10 | — | — | US | disclosed |
| US-20240296997-A1 | ELECTROLYTIC CAPACITOR ELEMENT | MURATA MANUFACTURING CO., LTD. (JP) | 2024-09-05 | — | — | US | disclosed |
| CN-118318282-A | Electrolytic capacitor element | 株式会社村田制作所 | 2024-07-09 | — | — | CN | disclosed |
| US-20230043077-A1 | ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING ELECTROLYTIC CAPACITOR | MURATA MANUFACTURING CO., LTD. (JP) | 2023-02-09 | — | — | US | disclosed |
| US-20230038003-A1 | ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING ELECTROLYTIC CAPACITOR | MURATA MANUFACTURING CO., LTD. (JP) | 2023-02-09 | — | — | US | disclosed |
| US-20230028493-A1 | ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING ELECTROLYTIC CAPACITOR | MURATA MANUFACTURING CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
| CN-115398576-A | Electrolytic capacitor and method for manufacturing electrolytic capacitor | 株式会社村田制作所 | 2022-11-25 | — | — | CN | disclosed |
| CN-115398577-A | Electrolytic capacitor and method for manufacturing electrolytic capacitor | 株式会社村田制作所 | 2022-11-25 | — | — | CN | disclosed |
| EP-0631324-B1 | Method of making ohmic contacts to a complementary semiconductor device | MOTOROLA ENERGY SYSTEMS INC (US) | 2001-09-26 | — | — | EP | disclosed |
| US-5480829-A | Method of making a III-V complementary heterostructure device with compatible non-gold ohmic contacts | MOTOROLA, INC. (US) | 1996-01-02 | — | — | US | disclosed |
| US-5444016-A | Method of making ohmic contacts to a complementary III-V semiconductor device | NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC. (NL) | 1995-08-22 | — | — | US | disclosed |
| EP-0631323-A1 | III-V Complementary heterostructure device with compatible non-gold ohmic contacts | MOTOROLA, INC. (US) | 1994-12-28 | — | — | EP | disclosed |
| EP-0631324-A1 | Method of making ohmic contacts to a complementary semiconductor device | Motorola Energy Systems Inc. (US) | 1994-12-28 | — | — | EP | disclosed |