⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4705495 | 0.86 | — | — | |
| SCHEMBL6654356 | 0.84 | — | — | |
| SCHEMBL7780911 | 0.82 | — | — | |
| SCHEMBL7775500 | 0.82 | — | — | |
| SCHEMBL7775483 | 0.82 | — | — | |
| SCHEMBL7779717 | 0.82 | — | — | |
| SCHEMBL7775713 | 0.82 | — | — | |
| SCHEMBL7782834 | 0.82 | — | — | |
| SCHEMBL5715425 | 0.82 | — | — | |
| SCHEMBL2826548 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108473515-B | Polyhedral oligomeric silsesquioxane and preparation method thereof | 株式会社LG化学 | 2021-01-12 | — | — | CN | claimed |
| CN-107849068-B | Method for preparing polyhedral oligomeric silsesquioxanes | 株式会社LG化学 | 2020-09-11 | — | — | CN | claimed |
| US-10683313-B2 | Polyhedral oligomeric silsesquioxane and preparation method thereof | LG CHEM, LTD. (KR) | 2020-06-16 | — | — | US | claimed |
| US-10501583-B2 | Method for preparing polyhedral oligomeric silsesquioxane | LG CHEM, LTD. (KR) | 2019-12-10 | — | — | US | claimed |
| US-20190023728-A1 | POLYHEDRAL OLIGOMERIC SILSESQUIOXANE AND PREPARATION METHOD THEREOF | LG CHEM, LTD. (KR) | 2019-01-24 | — | — | US | claimed |
| US-20180201734-A1 | METHOD FOR PREPARING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE | LG CHEM, LTD. (KR) | 2018-07-19 | — | — | US | claimed |
| CN-107209146-B | Electrochemical gas sensor and electrolyte for electrochemical gas sensor | 德尔格安全股份两合公司 | 2024-03-12 | — | — | CN | disclosed |
| WO-2023188609-A1 | ANTIFOULING TREATMENT AGENT, ANTIFOULING TREATMENT AGENT STOCK SOLUTION, AND ANTIFOULING TREATMENT METHOD | パナソニックＩＰマネジメント株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-11592605-B2 | Color developing structure having concave-convex layer, method for producing such structure, and display | TOPPAN PRINTING CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| CN-108473515-B | Polyhedral oligomeric silsesquioxane and preparation method thereof | 株式会社LG化学 | 2021-01-12 | — | — | CN | disclosed |
| CN-107849068-B | Method for preparing polyhedral oligomeric silsesquioxanes | 株式会社LG化学 | 2020-09-11 | — | — | CN | disclosed |
| US-10683313-B2 | Polyhedral oligomeric silsesquioxane and preparation method thereof | LG CHEM, LTD. (KR) | 2020-06-16 | — | — | US | disclosed |
| EP-3647835-A1 | COLORING STRUCTURE, DISPLAY BODY, AND METHOD FOR MANUFACTURING COLORING STRUCTURE | Toppan Printing Co., Ltd. (JP) | 2020-05-06 | — | — | EP | disclosed |
| CN-110799861-A | Color developing structure, display body, and method for producing color developing structure | 凸版印刷株式会社 | 2020-02-14 | — | — | CN | disclosed |
| US-10501583-B2 | Method for preparing polyhedral oligomeric silsesquioxane | LG CHEM, LTD. (KR) | 2019-12-10 | — | — | US | disclosed |
| US-20190023728-A1 | POLYHEDRAL OLIGOMERIC SILSESQUIOXANE AND PREPARATION METHOD THEREOF | LG CHEM, LTD. (KR) | 2019-01-24 | — | — | US | disclosed |
| US-20180201734-A1 | METHOD FOR PREPARING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE | LG CHEM, LTD. (KR) | 2018-07-19 | — | — | US | disclosed |
| EP-0825167-B1 | COMPOUNDS AND SURFACTANTS | ASAHI DENKA KOGYO KK (JP) | 2001-10-04 | — | — | EP | disclosed |
| US-5929290-A | A HYDROPHILIC POLYETHER HAVING A FLUORO-SUBSTITUTED ALKYL END GROUP AND A (METH)ALLYL GLYCIDYL END GROUP; EMULSIFIERS AND DISPERSANTS FOR EMULSION AND SUSPENSION POLYMERIZATION, RESP.; RESIN REFORMING AGENTS; ANTISOILANTS FOR POLYESTERS | ASAHI DENKA KOGYO K. K. (JP) | 1999-07-27 | — | — | US | disclosed |
| EP-0825167-A1 | COMPOUNDS AND SURFACTANTS | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 1998-02-25 | — | — | EP | disclosed |