SCHEMBL7784463

SCHEMBL7784463

O=C(O)COc1cccc(O)c1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.58
ALDH1A1 P00352 3/20 0.58
HPGD P15428 3/20 0.58
TDP1 Q9NUW8 1/20 0.58
L3MBTL1 Q9Y468 2/20 0.56
SMN1; SMN2 Q16637 2/20 0.56
POLB P06746 1/20 0.56
GLA P06280 1/20 0.56
PTGDR2 Q9Y5Y4 3/20 0.53
CD69 Q07108 3/20 0.50
HSD17B10 Q99714 2/20 0.50
ALOX15 P16050 2/20 0.50
CASP1 P29466 1/20 0.50
KMT2A Q03164 1/20 0.48
GAA P10253 1/20 0.47
LMNA P02545 1/20 0.47
TP53 P04637 1/20 0.47
CYP3A4 P08684 1/20 0.47
MAPT P10636 1/20 0.47
ALOX12 P18054 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1123330 0.86 L3MBTL1 (0.63) KDM4EALDH1A1HPGDTDP1L3MBTL1
Hydrochloric Acid SCHEMBL1375092 0.84 L3MBTL1 (0.61) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL6746949 0.83 L3MBTL1 (0.56) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL10959997 0.83 KDM4E (0.67) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL740284 0.82 HPGD (0.50) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL10347732 0.82 GAA (0.43) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL29682135 0.81 L3MBTL1 (0.80) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL340762 0.81 L3MBTL1 (0.80) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL3965332 0.80 MAOB (0.58) KDM4EALDH1A1HPGDTDP1L3MBTL1
SCHEMBL1145948 0.79 KMT2A (0.62) KDM4EALDH1A1HPGDTDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0671660-B1 Lead-frame forming material FUJI PHOTO FILM CO LTD (JP) 2001-10-17 EP disclosed
US-5670293-A LIGHT SENSITIVE MATERIAL WITH COPPER OR NICKEL ALLOYS, DRYING A PHOTOSENSITIVE LAYER AND WINDING THE COATED WEB INTO STRIPS AND STACKING FUJI PHOTO FILM CO., LTD. (JP) 1997-09-23 US disclosed
EP-0671660-A2 Lead-frame forming material FUJI PHOTO FILM CO., LTD. (JP) 1995-09-13 EP disclosed
US-4497888-A ALUMINUM SUPPORTS FUJI PHOTO FILM CO., LTD. (JP) 1985-02-05 US disclosed