SCHEMBL778531

SCHEMBL778531

O=S(=O)(OC(F)(F)C(F)(F)F)OC(F)(F)C(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 1/20 0.32
CA7 P43166 1/20 0.30
CA13 Q8N1Q1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL776066 0.83 USP2 (0.32) CA1CA2
SCHEMBL778299 0.81 CA2 (0.33) CA1CA2
SCHEMBL777312 0.79 CA2 (0.37) CA1CA2
SCHEMBL778516 0.79 CA1 (0.50) CA1CA2CA9
SCHEMBL777861 0.77 CA1 (0.37) CA1CA2CA9
SCHEMBL22588993 0.77 CA2 (0.41) CA1CA2
SCHEMBL22588846 0.77 CA2 (0.41) CA1CA2
SCHEMBL22588953 0.77 CA2 (0.41) CA1CA2
SCHEMBL4125859 0.75 USP2 (0.35)
SCHEMBL3646301 0.75 TSHR (0.39) CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12319798-B2 Water-soluble film and packaging KURARAY CO., LTD. (JP) 2025-06-03 US disclosed
CN-113874426-B Water-soluble film and package 株式会社可乐丽 2025-03-28 CN disclosed
US-12100809-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-24 US disclosed
US-20220149436-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-11283107-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2022-03-22 US disclosed
EP-3960798-A1 WATER-SOLUBLE FILM AND PACKAGING Kuraray Co., Ltd. (JP) 2022-03-02 EP disclosed
US-20220041824-A1 WATER-SOLUBLE FILM AND PACKAGING KURARAY CO., LTD. (JP) 2022-02-10 US disclosed
WO-2020218321-A1 WATER-SOLUBLE FILM AND PACKAGING 株式会社クラレ 2020-10-29 WO disclosed
US-20190229372-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2019-07-25 US disclosed
US-20190165417-A1 Sulfonylimide Compound, Production Method Thereof, Electrolyte Composition, Electrolytic Solution and Lithium Ion Battery NIPPON SHOKUBAI CO., LTD. (JP) 2019-05-30 US disclosed
US-9252457-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2016-02-02 US disclosed
US-20150188192-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2015-07-02 US disclosed
US-20150056503-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2015-02-26 US disclosed
US-20120177988-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2012-07-12 US disclosed
US-20120070731-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2012-03-22 US disclosed
US-20090325065-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2009-12-31 US disclosed
EP-1508072-A2 ACID GENERATING AGENTS AND THEIR USE IN PROCESSES FOR IMAGING RADIATION-SENSITIVE ELEMENTS Kodak Polychrome Graphics LLC (US) 2005-02-23 EP disclosed
US-6787281-B2 SUCH AS 2-METHOXY-4-(PHENYLAMINO)-BENZENEDIAZONIUM DODECYL SULFATE (MSDS), WHICH DOES NOT CONTAIN OZONE DEPLETION ELEMENTS (FLUORINE, HEAVY METALS); POLLUTION CONTROL; LITHOGRAPHY KODAK POLYCHROME GRAPHICS LLC 2004-09-07 US disclosed
WO-2004036314-A2 ACID GENERATING AGENTS AND THEIR USE IN PROCESSES FOR IMAGING RADIATION-SENSITIVE ELEMENTS KODAK POLYCHROME GRAPHICS LLC (US) 2004-04-29 WO disclosed
US-20030219673-A1 Selected acid generating agents and their use in processes for imaging radiation-sensitive elements FPC INC. 2003-11-27 US disclosed