SCHEMBL7785325

SCHEMBL7785325

C[SiH2]C.C[SiH2]c1ccccc1.C[SiH3]

nearest known ligand 0.35

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.35
LMNA P02545 1/20 0.33
ALOX12 P18054 1/20 0.33
ACHE P22303 1/20 0.33
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
MGLL Q99685 1/20 0.32
HSD17B10 Q99714 1/20 0.32
LTA4H P09960 1/20 0.32
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28535293 0.97 TSHR (0.36) TSHRLMNAALOX12ACHEMAPT
SCHEMBL9718210 0.94 TSHR (0.37) TSHRLMNAALOX12ACHEMAPT
SCHEMBL67968 0.91
Hydrochloric Acid SCHEMBL28181815 0.88
Hydrochloric Acid SCHEMBL5702841 0.88 TSHR (0.37) TSHRLMNAALOX12ACHEMAPT
Hydrochloric Acid SCHEMBL7937814 0.88 TSHR (0.37) TSHRLMNAALOX12ACHEMAPT
SCHEMBL27968456 0.88
Fluoride SCHEMBL29655462 0.88
Ammonia Solution, Strong SCHEMBL28586237 0.88
Water SCHEMBL28098685 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1148539-A2 Method of depositing low K films using an oxidizing plasma APPLIED MATERIALS, INC. (US) 2001-10-24 EP claimed