SCHEMBL7786076

SCHEMBL7786076

CC(=O)CC(=S)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10705378 0.81 LDHA (0.38)
SCHEMBL285986 0.75
SCHEMBL9560314 0.75
Hydrogen Peroxide SCHEMBL1310659 0.73
Ammonia Solution, Strong SCHEMBL28082756 0.73 LDHA (0.47)
SCHEMBL28291356 0.73
SCHEMBL11805581 0.73 KDM4E (0.42)
Hydrochloric Acid SCHEMBL28198858 0.73
SCHEMBL5279189 0.71
Acetic Acid SCHEMBL28823501 0.70 FFAR3 (0.58)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6218518-B1 FOR FORMING GROUP II THIN FILMS ON SUBSTRATES FOR MICROELECTRONIC DEVICE APPLICATIONS SUCH AS INTEGRATED CIRCUITS, FERROELECTRIC MEMORIES, SWITCHES, RADIATION DETECTORS, THIN-FILM CAPACITORS, HOLOGRAPHIC STORAGE ADVANCED TECHNOLOGY MATERIALS, INC. 2001-04-17 US disclosed