Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 6/20 | 0.64 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.64 |
| ▸ | ALOX12 | P18054 | 4/20 | 0.64 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.64 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.64 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.64 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.64 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.64 |
| ▸ | TSHR | P16473 | 5/20 | 0.50 |
| ▸ | TTR | P02766 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.50 |
| ▸ | RECQL | P46063 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | THRB | P10828 | 3/20 | 0.46 |
| ▸ | KIF11 | P52732 | 1/20 | 0.41 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.41 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 4/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.40 |
| ▸ | ESR1 | P03372 | 3/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11142489 | 0.84 | HSD17B10 (0.46) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL13801377 | 0.84 | HSD17B10 (0.64) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL736680 | 0.82 | HSD17B10 (0.61) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL4464101 | 0.78 | HSD17B10 (0.70) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL1595467 | 0.78 | HSD17B10 (1.00) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL9908614 | 0.77 | HSD17B10 (0.54) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL17612792 | 0.74 | HSD17B10 (0.64) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL16150316 | 0.73 | HSD17B10 (0.50) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL9808035 | 0.73 | HSD17B10 (0.50) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A | |
| SCHEMBL837133 | 0.73 | HSD17B10 (0.50) | HSD17B10ALOX15ALOX12SMN1; SMN2HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1148934-A1 | MEMBRANE FOR SEPARATION OF XENON FROM OXYGEN AND NITROGEN AND METHOD OF USING SAME | MESSER GRIESHEIM GMBH (DE) | 2001-10-31 | — | — | EP | disclosed |
| US-6217995-B1 | TRANSPARENT POLYCARBONATE OR POLYESTERCARABONATE CONTAINING CYCLIC ALIPHATIC GROUP, HAVING A VISIBLE LIGHT TRANSMITTANCE MORE THAN 80% AND A GLASS TRANSITION TEMPERATURE LESS THAN 80 DEGREE C. EXHIBIT BIREFRINGENCE INDEX LESS THAN 15 NM | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-04-17 | — | — | US | disclosed |
| US-6168649-B1 | THIN DISCRIMINATING LAYER SELECTED FROM THE GROUP CONSISTING OF POLYCARBONATE, POLYESTER, AND POLYESTERCARBONATE. | MG GENERON, INC. | 2001-01-02 | — | — | US | disclosed |
| WO-2000033949-A1 | MEMBRANE FOR SEPARATION OF XENON FROM OXYGEN AND NITROGEN AND METHOD OF USING SAME | MESSER GRIESHEIM GMBH (DE) | 2000-06-15 | — | — | WO | disclosed |
| EP-0739879-B1 | Halogen-containing cyanate ester, process for producing the same and thermosetting resin composition containing the same | SUMITOMO CHEMICAL CO (JP) | 1999-12-22 | — | — | EP | disclosed |
| EP-0739879-A1 | Halogen-containing cyanate ester, process for producing the same and thermosetting resin composition containing the same | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1996-10-30 | — | — | EP | disclosed |
| US-5196531-A | Poly(N-cyclic iminoether), process for production thereof, thermosetting composition containing it and thermoset resin | TEIJIN LIMITED (JP) | 1993-03-23 | — | — | US | disclosed |
| US-5189094-A | Reacting a poly(cyclic iminoether), and ethylenically unsaturated compounds | TEIJIN LIMITED (JP) | 1993-02-23 | — | — | US | disclosed |
| EP-0351814-A2 | Poly (N-cyclic iminoether), processes for production thereof, thermosetting composition containing it and thermoset resin | TEIJIN LIMITED (JP) | 1990-01-24 | — | — | EP | disclosed |
| EP-0336390-A2 | Process for producing thermoset resin | TEIJIN LIMITED (JP) | 1989-10-11 | — | — | EP | disclosed |
| US-4354994-A | Spinning process for antimony oxide/halogenated aromatic polyester composition | CELANESE CORPORATION (US) | 1982-10-19 | — | — | US | disclosed |
| US-4355152-A | HEAT TREATMENT | CELANESE CORPORATION (US) | 1982-10-19 | — | — | US | disclosed |
| US-4346209-A | HEAT TREATMENT AT CONSTANT LENGTH FOLLOWED BY TREATMENT WI HOT PERCHLOROETHYLENE | CELANESE CORPORATION (US) | 1982-08-24 | — | — | US | disclosed |
| US-4322521-A | Process for producing halogenated aromatic polyesters | CELANESE CORPORATION (US) | 1982-03-30 | — | — | US | disclosed |
| EP-0007940-A1 | SOLUTION POLYMERIZED HALOGENATED POLYESTERS | CELANESE CORPORATION (US) | 1980-02-20 | — | — | EP | disclosed |
| US-4150068-A | OLIGOMERIC POLYHALOPHOSPHATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1979-04-17 | — | — | US | disclosed |
| US-4145218-A | AMINO-THIO COMPOUNDS | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1979-03-20 | — | — | US | disclosed |
| WO-1979000071-A1 | SOLUTION POLYMERIZED HALOGENATED POLYESTERS | CELANESE CORP (US) | 1979-02-22 | — | — | WO | disclosed |
| US-4132705-A | Process for preparing a halogenated aromatic polyester having a predetermined molecular weight by solution polymerization technique | CELANESE CORPORATION (US) | 1979-01-02 | — | — | US | disclosed |
| US-4066623-A | INVERSE INTERFACIAL POLYMERIZATION FOR PREPARING CERTAIN HALOGENATED AROMATIC POLYESTERS | CELANESE CORPORATION (US) | 1978-01-03 | — | — | US | disclosed |