Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.63 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.62 |
| ▸ | GLA | P06280 | 1/20 | 0.62 |
| ▸ | TP53 | P04637 | 3/20 | 0.61 |
| ▸ | TSHR | P16473 | 3/20 | 0.61 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.61 |
| ▸ | MEN1 | O00255 | 2/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | PKM | P14618 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | PPARG | P37231 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.43 |
| ▸ | SRC | P12931 | 1/20 | 0.43 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29417585 | 1.00 | TDP1 (0.63) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL23338288 | 0.90 | TDP1 (0.53) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL31120490 | 0.87 | TDP1 (0.58) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL8847178 | 0.84 | ALDH1A1 (0.54) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL22357196 | 0.84 | ALDH1A1 (0.78) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL679937 | 0.84 | ALDH1A1 (0.78) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL26656743 | 0.83 | ALDH1A1 (0.57) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL3952927 | 0.83 | ALDH1A1 (0.49) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL12855148 | 0.82 | TDP1 (0.56) | TDP1ALDH1A1GLATP53TSHR | |
| SCHEMBL17912873 | 0.82 | ALDH1A1 (0.59) | TDP1ALDH1A1GLATP53TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113056519-B | Curable resin composition and curable sheet | 长濑化成株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-117396959-A | Recording medium, information recording method, information reading method, and composition for producing recording layer | 松下知识产权经营株式会社 | 2024-01-12 | — | — | CN | disclosed |
| WO-2023238920-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM TO REDUCE ENVIRONMENTAL IMPACT | 日産化学株式会社 | 2023-12-14 | — | — | WO | disclosed |
| WO-2023182408-A1 | COMPOSITION FOR FORMING RESIST-LOWER-LAYER FILM INCLUDING FLUORENE SKELETON | 日産化学株式会社 | 2023-09-28 | — | — | WO | disclosed |
| WO-2023181960-A1 | COMPOSITION FOR FORMING PROTECTIVE FILM | 日産化学株式会社 | 2023-09-28 | — | — | WO | disclosed |
| CN-112823177-B | Resin composition | 纳美仕有限公司 | 2023-08-15 | — | — | CN | disclosed |
| WO-2023149327-A1 | PROTECTIVE FILM FORMING COMPOSITION | 日産化学株式会社 | 2023-08-10 | — | — | WO | disclosed |
| US-20220404706-A1 | CHEMICAL-RESISTANT POLYVALENT CARBOXYLIC ACID-CONTAINING PROTECTIVE FILM | NISSAN CHEMICAL CORPORATION (JP) | 2022-12-22 | — | — | US | disclosed |
| CN-113130438-B | Component carrier and method for producing the same | 奥特斯(中国)有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-114839838-A | Photosensitive resin composition | 味之素株式会社 | 2022-08-02 | — | — | CN | disclosed |
| CN-112823177-A | Resin composition | 纳美仕有限公司 | 2021-05-18 | — | — | CN | disclosed |
| WO-2020166580-A1 | METHOD FOR PRODUCING POLYMER | 日産化学株式会社 | 2020-08-20 | — | — | WO | disclosed |
| CN-102568656-B | Double-deck anisotropic conductive film and the device comprising this conducting film | CHEIL INDUSTRIES INC. (KR) | 2016-01-20 | — | — | CN | disclosed |
| CN-103097460-B | Phenolic resin composition, cured relief pattern, and method for producing semiconductor | ASAHI KASEI E-MATERIALS CORP. (JP) | 2015-10-21 | — | — | CN | disclosed |
| CN-104945609-A | Perfluoroalkylene ether-containing compound and surface protective film | FUJI XEROX CO LTD | 2015-09-30 | — | — | CN | disclosed |
| CN-103988127-A | Photosensitive resin composition, method for producing cured relief pattern, semiconductor device, and display device | ASAHI KASEI E MATERIALS CORP | 2014-08-13 | — | — | CN | disclosed |
| EP-0810249-B1 | Thermosetting resin composition, electrically insulated coil, electric rotating machine and method for producing same | HITACHI LTD (JP) | 2001-11-07 | — | — | EP | disclosed |
| US-5982056-A | STATOR OF ROTATING MACHINE | HITACHI, LTD. (JP) | 1999-11-09 | — | — | US | disclosed |
| EP-0810249-A2 | Thermosetting resin composition, electrically insulated coil, electric rotating machine and method for producing same | HITACHI, LTD. (JP) | 1997-12-03 | — | — | EP | disclosed |
| US-3996284-A | Naphthyl and tetrahydronaphthyl di-ethers | NAUTA WIJBE THOMAS | 1976-12-07 | — | — | US | disclosed |