SCHEMBL7792431

SCHEMBL7792431

O=S(=O)(OS1(c2ccccc2)CCC(OCc2ccccc2)C1)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTSL P07711 2/20 0.34
CTSB P07858 2/20 0.34
CTSK P43235 2/20 0.34
OPRM1 P35372 2/20 0.34
OPRL1 P41146 2/20 0.34
DPP4 P27487 1/20 0.34
CA2 P00918 2/20 0.33
CA1 P00915 1/20 0.33
CA9 Q16790 1/20 0.33
MMP2 P08253 1/20 0.33
MMP13 P45452 1/20 0.33
SIGMAR1 Q99720 2/20 0.33
TMEM97 Q5BJF2 1/20 0.33
CARM1 Q86X55 1/20 0.33
PRMT6 Q96LA8 1/20 0.33
PRMT8 Q9NR22 1/20 0.33
HRH3 Q9Y5N1 1/20 0.33
DRD2 P14416 1/20 0.32
DRD1 P21728 1/20 0.32
DRD4 P21917 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564778 0.87 DRD2 (0.32) DRD2DRD1DRD4DRD5DRD3
SCHEMBL6564010 0.85 DRD3 (0.33) OPRM1DRD2DRD1DRD4DRD5
SCHEMBL6564715 0.85
SCHEMBL2673277 0.84 CA1 (0.34) CTSLCTSBCTSKOPRM1OPRL1
SCHEMBL6562810 0.83
SCHEMBL6562904 0.77
SCHEMBL6564339 0.76
SCHEMBL6564828 0.75
SCHEMBL6566234 0.75 BCHE (0.31) BCHE
SCHEMBL6562645 0.75 DRD3 (0.35) OPRM1MMP2DRD2DRD1DRD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed